journal article·2004-11

Picosecond pulsed laser deposition at high vibrational excitation density: the case of poly(tetrafluoroethylene)

M.R. Papantonakis, R.F. Haglund

Applied Physics A· Volume 79· Issue 7
Publisher page

Abstract

The availability of tunable, picosecond free-electron lasers operating with high efficiency in the mid-infrared opens a materials-processing regime qualitatively distinct from that accessed by femtosecond Ti:sapphire lasers, one which is characterized by a high spatio-temporal density of vibrational, rather than electronic, excitation. As an example of this novel materials-processing regime, we present new results on pulsed laser deposition of thin poly(tetrafluoroethylene) films. Films of poly(tetrafluoroethylene) were deposited by resonant (4.2 and 8.26 μm) and non-resonant (7.1 μm) infrared picosecond laser ablation from either a pressed powder target or a commercial bulk target. The films were smooth and crystalline and largely free of particulates without annealing. Infrared and X-ray photoelectron spectra indicated that the films retained the chemical properties of the starting material. Observations of the film properties are consistent with a steady-state ablation mechanism, possibly enhanced by non-linear absorption due to the high photon flux in the free-electron laser micropulses.
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Research context

OpenAlex topics: Laser Material Processing Techniques · Laser-induced spectroscopy and plasma · Laser Design and Applications

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References (44)

Show source-provided references
1. E.G. Gamaly, A.V. Rode, B. Luther-Davies: J. Appl. Phys. 85, 4213 (1999)10.1063/1.370333 ↗
2. A.V. Rode, B. Luther-Davies, E.G. Gamaly: J. Appl. Phys. 85, 4222 (1999)10.1063/1.370334 ↗
3. G.R. Neil, C.L. Bohn, S.V. Benson, G. Biallas, D. Douglas, H.F. Dylla, R. Evans, J. Fugitt, A. Grippo, J. Gubeli, R. Hill, K. Jordan, G.A. Krafft, R. Li, L. Merminga, P. Piot, J. Preble, M. Shinn, T. Siggins, R. Walker, B. Yunn: Phys. Rev. Lett. 84, 5238 (2000)10.1103/PhysRevLett.84.5238 ↗
4. J.R. Hill, A. Tokmakoff, K.A. Peterson, B. Sauter, D. Zimdars, D.D. Dlott, M.D. Fayer: J. Phys. Chem. 98, 11213 (1994)10.1021/j100094a032 ↗
5. D.D. Dlott, M.D. Fayer: J. Opt. Soc. Am. B 6, 977 (1989)10.1364/JOSAB.6.000977 ↗
6. D.M. Bubb, J.S. Horwitz, J.H. Callahan, R.A. McGill, E.J. Houser, D.B. Chrisey, M.R. Papantonakis, R.F. Haglund, M.C. Galicia, A. Vertes: J. Vac. Sci. Technol. A 19, 2698 (2001)10.1116/1.1387052 ↗
7. D.M. Bubb, J.S. Horwitz, R.A. McGill, D.B. Chrisey, M.R. Papantonakis, R.F. Haglund, B. Toftmann: Appl. Phys. Lett. 79, 2847 (2001)10.1063/1.1406556 ↗
8. D.M. Bubb, R.A. McGill, J.S. Horwitz, J.M. Fitz-Gerald, E.J. Houser, R.M. Stroud, P.W. Wu, B.R. Ringeisen, A. Pique, D.B. Chrisey: J. Appl. Phys. 89, 5739 (2001)10.1063/1.1362405 ↗
9. D.M. Bubb, M.R. Papantonakis, J.S. Horwitz, R.F. Haglund, B. Toftmann, R.A. McGill, D.B. Chrisey: Chem. Phys. Lett. 352, 135 (2002)10.1016/S0009-2614(01)01423-3 ↗
10. D.M. Bubb, M.R. Papantonakis, B. Toftmann, J.S. Horwitz, R.A. McGill, D.B. Chrisey, R.F. Haglund: J. Appl. Phys. 91, 9809 (2002)10.1063/1.1478136 ↗
11. D.M. Bubb, B. Toftmann, R.F. Haglund, J.S. Horwitz, M.R. Papantonakis, R.A. McGill, P.W. Wu, D.B. Chrisey: Appl. Phys. A 74, 123 (2002)10.1007/s003390101010 ↗
12. B. Hopp, T. Smausz, N. Kresz, P.M. Nagy, A. Juhasz, F. Ignacz, Z. Marton: Appl. Phys. A 76, 731 (2003)10.1007/s00339-002-1512-7 ↗
13. L. Holland, L. Laurenso, R.E. Hurley, K. Williams: Nucl. Instrum. Methods 111, 555 (1973)10.1016/0029-554X(73)90216-4 ↗
14. M.A. Golub, T. Wydeven, A.L. Johnson: Langmuir 14, 2217 (1998)10.1021/la971102e ↗
15. J.L. He, W.Z. Li, L.D. Wang, J. Wang, H.D. Li: Nucl. Instrum. Methods B 135, 512 (1998)10.1016/S0168-583X(97)00630-7 ↗
16. T. Katoh, Y. Zhang: Appl. Surf. Sci. 138–139, 165 (1999)10.1016/S0169-4332(98)00395-X ↗
17. D.B. Chrisey, A. Pique, R.A. McGill, J.S. Horwitz, B.R. Ringeisen, D.M. Bubb, P.K. Wu: Chem. Rev. 103, 553 (2003)10.1021/cr010428w ↗
18. D.B. Chrisey, G.K. Hilbert (eds.): Pulsed Laser Deposition of Thin Solid Films (Wiley, New York 1994)
19. W.B. Jiang, M.G. Norton, L. Tsung, J.T. Dickinson: J. Mater. Res. 10, 1038 (1995)10.1557/JMR.1995.1038 ↗
20. N. Huber, J. Heitz, D. Bauerle, R. Schwodiauer, S. Bauer, H. Niino, A. Yabe: Appl. Phys. A 72, 581 (2001)10.1007/s003390100825 ↗
21. S.T. Li, E. Arenholz, J. Heitz, D. Bauerle: Appl. Surf. Sci. 125, 17 (1998)10.1016/S0169-4332(97)00398-X ↗
22. G.B. Blanchet, S.I. Shah: Appl. Phys. Lett. 62, 1026 (1993)10.1063/1.108514 ↗
23. T. Smausz, N. Kresz, B. Hopp: Appl. Surf. Sci. 177, 66 (2001)10.1016/S0169-4332(01)00204-5 ↗
24. J. Heitz, J.T. Dickinson: Appl. Phys. A 68, 515 (1999)10.1007/s003390050934 ↗
25. S. Kuper, M. Stuke: Appl. Phys. Lett. 54, 4 (1989)10.1063/1.100831 ↗
26. Z.B. Wang, M.H. Hong, Y.F. Lu, D.J. Wu, B. Lan, T.C. Chong: J. Appl. Phys. 93, 6375 (2003)10.1063/1.1568154 ↗
27. H. Kumagai, K. Midorikawa, K. Toyoda, S. Nakamura, T. Okamoto, M. Obara: Appl. Phys. Lett. 65, 1850 (1994)10.1063/1.112863 ↗
28. M. Womack, M. Vendan, P. Molian: Appl. Surf. Sci. 221, 99 (2004)10.1016/S0169-4332(03)00835-3 ↗
29. Y. Tsuboi, T. Kuro-Oka, K. Irie, A. Itaya: Appl. Phys. A 78, 339 (2004)10.1007/s00339-002-2074-4 ↗
30. M. Inayoshi, M. Hori, T. Goto, M. Hiramatsu, M. Nawata, S. Hattori: J. Vac. Sci. Technol. A 14, 1981 (1996)10.1116/1.580071 ↗
31. J. Pola, J. Kupcik, V. Blechta, A. Galikova, A. Galik, J. Subrt, J. Kurjata, J. Chojnowski: Chem. Mater. 14, 1242 (2002)10.1021/cm0112338 ↗
32. B. Hopp, Z. Geretovszky, I. Bertoti, I.W. Boyd: Appl. Surf. Sci. 186, 80 (2002)10.1016/S0169-4332(01)00753-X ↗
33. G.S. Edwards, D. Evertson, W. Gabella, R. Grant, T.L. King, J. Kozub, M. Mendenhall, J. Shen, R. Shores, S. Storms, R.H. Traeger: IEEE J. Sel. Top. Quantum Electron. 2, 810 (1996)10.1109/2944.577303 ↗
34. C.A. Sperati: in Polymer Handbook, ed. by J. Bandrup, E.H. Immergut (Wiley, New York 1989)
35. B. Ivanov, C. Popov, M. Lekova, D. Yankova, G. Peev: Appl. Surf. Sci. 108, 297 (1997)10.1016/S0169-4332(96)00596-X ↗
36. G.B. Blanchet: J. Appl. Phys. 80, 4082 (1996)10.1063/1.363278 ↗
37. K.P. Adhi, R.L. Owings, T.A. Railkar, W.D. Brown, A.P. Malshe: Appl. Surf. Sci. 218, 17 (2003)10.1016/S0169-4332(03)00586-5 ↗
38. J.F. Moulder: Handbook of X-ray Photoelectron Spectroscopy (Physical Electronics, Eden Prairie, MN 1995)
39. R.E. Moynihan: J. Am. Chem. Soc. 81, 1045 (1959)10.1021/ja01514a009 ↗
40. M.A. Golub, B.A. Banks, S.K. Rutledge, M.C. Kitral: in Fluorinated Surfaces, Coatings and Films, Vol. 787, ed. by D.G. Castner, D.W. Grainger (American Chemical Society, Washington, DC 2001) p. 21310.1021/bk-2001-0787.ch016 ↗
41. E.G. Gamaly, A.V. Rode, B. Luther-Davies: J. Appl. Phys. 85, 4213 (1999)10.1063/1.370333 ↗
42. A. Vogel, V. Venugopalan: Chem. Rev. 103, 577 (2003)10.1021/cr010379n ↗
43. D.R. Ermer, M.R. Papantonakis, M. Baltz-Knorr, D. Nakazawa, R.F. Haglund: Appl. Phys. A 70, 633 (2000)10.1007/PL00021072 ↗
44. A.M. Stoneham, M.M.D. Ramos, R.M. Ribeiro: Appl. Phys. A 69, S81 (1999)10.1007/s003399900249 ↗