journal article·2019-08

Grain and grain boundaries contributions to dielectric relaxation of the clay-based ceramics

Ragab M. Mahani, Shereen Omara

Applied Physics A· Volume 125· Issue 8
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Dielectric properties of ceramics · Ferroelectric and Piezoelectric Materials · Microwave Dielectric Ceramics Synthesis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (45)

Show source-provided references
1. V. Garcia, M. Bibes, L. Bocher, S. Valencia, F. Kronast, A. Crassous, X. Moya, S. Enouz-Vedrenne, A. Gloter, D. Imhoff, C. Deranlot, N.D. Mathur, S. Fusil, K. Bouzehouane, A. Barthélémy, Science 327, 1106 (2010)10.1126/science.1184028 ↗
2. A. Chanthbouala, A. Crassous, V. Garcia, K. Bouzehouane, S. Fusil, X. Moya, J. Allibe, B. Dlubak, J. Grollier, S. Xavier, C. Deranlot, A. Moshar, R. Proksch, N. D. Mathur, M. Bibes, A. Barthélémy, Nature Nanotechnol. 7, 101 (2012)10.1038/nnano.2011.213 ↗
3. J. Seidel, W. Luo, S.J. Suresha, P.-K. Nguyen, A.S. Lee, S.-Y. Kim, C.-H. Yang, S.J. Pennycook, S.T. Pantelides, J.F. Scott, R. Ramesh, Nature Commun. 3, 799 (2012)10.1038/ncomms1799 ↗
4. G. Catalan, J. Seidel, J.F. Scott, R. Ramesh, Rev. Mod. Phys. 84, 119 (2012)10.1103/RevModPhys.84.119 ↗
5. D. Daranciang, H. Highland, S. M.Wen, N.C. Young., H.Y. Brandt, M. Hwang, M. Vattilana, F. Nicoul, J. Quirin, M.J. Goodfellow, T. Qi, I. Grinberg, D.M. Fritz, Cammarata M., D. Zhu, H.T. Lemke, D.A. Walko, E.M. Dufresne, Y. Li, J. Larsson, D.A. Reisn, K. Sokolowski-Tinte, K.A. Nelson, A.M. Rappe, P.H. Fuoss, G.B. Stephenson, A.M. Lindenberg, Phys. Rev. Lett. 108, 087601 (2012)10.1103/PhysRevLett.108.087601 ↗
6. I. K. Battisha, Ali B. Abou Hamad, Ragab M. Mahani, Phys. B 404, 2274 (2009)10.1016/j.physb.2009.04.038 ↗
7. R.M. Mahani, I.K. Battisha, M. Aly, A.B. Abou-Hamad, J. Alloys Compd. 508, 354 (2010)10.1016/j.jallcom.2010.05.060 ↗
8. D.A. Abdel Aziz, R.M. Mahani, Am. Ceramic Soc. Bull. 87, 9101 (2008)
9. D.A. Abdel Aziz, R.M. Mahani, D.M. Ibrahim, M.H. Aly, Ind Ceramics 30, 89 (2010)
10. R. M. Mahani, D. A. Abdel Aziz, Int. J. Adv. Eng. Technol. Comput. Sci. 2, 1 (2015).
11. R.M. MahaniI, D. A. Abdel Aziz, A. E. Reda, Int. J. Adv. Eng. Technol. Comput. Sci. 3, 27 (2016)
12. A.E. Reda, D.A. Abdel Aziz, R. M. Mahani, J. Phys. Sci. 28, 1 (2017)10.21315/jps2017.28.1.1 ↗
13. W. Bai, G. Chen, J.Y. Zhu, J. Yang, T. Lin, X.J. Meng, X.D. Tang, C.G. Duan, J.H. Chu, Appl. Phys. Lett. 100, 082902 (2012)10.1063/1.3688033 ↗
14. D.C. Sinclair, A.R. West, J. Appl. Phys. 66, 3850 (1989)10.1063/1.344049 ↗
15. R.K. Slotwinski, N. Bonanos, E.P. Butler, J. Mater. Sci. Lett. 4, 641 (1985)10.1007/BF00720055 ↗
16. M.P. Zheng, Y.D. Hou, F.Y. Xie, J. Chen, M.K. Zhu, H. Yan, Acta Mater. 61, 1489 (2013)10.1016/j.actamat.2012.11.026 ↗
17. R. Waser, R. Hagenbeck, Acta Mater. 48, 797 (2000)10.1016/S1359-6454(99)00367-5 ↗
18. Y.M. Kim, A. Morozovska, E. Eliseev, M.P. Oxley, R. Mishra, S.M. Selbach, T. Grande, S.T. Pantelides, S.V. Kalinin, A.Y. Borisevich, Nat. Mater. 13, 1019 (2014)10.1038/nmat4058 ↗
19. P. Liang, Y. Li, Y. Zhao, L. Wei, Z. Yang, J. Appl. Phys. 113, 224102 (2013)10.1063/1.4809927 ↗
20. S.F. Liu, Y.J. Wu, J. Li, X.M. Chen, Appl. Phys. Lett. 104, 082912 (2014)10.1063/1.4867069 ↗
21. M. Li, M.J. Pietrowski, R.A.D. Souza, H.R. Zhang, I.M. Reaney, S.N. Cook, J.A. Kilner, D.C. Sinclair, Nat. Mater. 13, 31 (2014)10.1038/nmat3782 ↗
22. S. Saha, T.P. Sinha, J. Appl. Phys. 99, 014109 (2006)10.1063/1.2160712 ↗
23. D.C. Sinclair, T.B. Adams, F.D. Morrison, A.R. West, Appl. Phys. Lett. 80, 2153 (2002)10.1063/1.1463211 ↗
24. T.B. Adams, D.C. Sinclair, A.R. West, Phys. Rev. B 73, 094124 (2006)10.1103/PhysRevB.73.094124 ↗
25. H. Kishi, Y. Okino, M. Honda, Y. Iguchi, M. Imaeda, Y. Takahashi, H. Ohsato, T. Okuda, Jpn. J. Appl. Phys. 36, 5954 (1997)10.1143/JJAP.36.5954 ↗
26. E. Barsoukov, J.R. Macdonald, Impedance Spectroscopy: Theory, Experiment and Applications, 2nd edn. (Wiley, New Jersey, 2005)10.1002/0471716243 ↗
27. S. Saha, T.P. Sinha, Phys. Rev. B 65, 134103 (2002)10.1103/PhysRevB.65.134103 ↗
28. K.P. Padmasree, D.K. Kanchan, A.R. Kulkarni, Solid State Ionics 177, 475 (2006)10.1016/j.ssi.2005.12.019 ↗
29. J.T.S. Irvine, D.C. Sinclair, A.R. West, Adv. Mater. 2, 132 (1990)10.1002/adma.19900020304 ↗
30. R.W. Wagner, Arch Electrotech. 2, 371 (1914)10.1007/BF01657322 ↗
31. A.K. Jonscher, Physics of Thin Films, ed. by M. H. Francombe, vol 11 (Academic Press, London, New York, 1980).
32. A.K. Jonscher, Nature 267, 673 (1977)10.1038/267673a0 ↗
33. T.B. Adams, D.C. Sinclair, A.R. West, Adv. Mater. 18, 1321 (2002)10.1002/1521-4095(20020916)14:18<1321::AID-ADMA1321>3.0.CO;2-P ↗
34. S. Rani, N. Ahlawat, R. Punia, K.M. Sangwan, S. Rani, Ceram. Int. 44, 5996 (2018)10.1016/j.ceramint.2017.12.187 ↗
35. K.M. Sangwan, N. Ahlawat, R.S. Kundu, S. Rani, S. Rani, Ceramics Int. 44, 10315–10321 (2018)10.1016/j.ceramint.2018.03.039 ↗
36. J. Nomoto, K. Inaba, M. Osada, S. Kobayashi, H. Makino, T. Yamamoto, J. Appl. Phys. 120, 125302–125311 (2016)10.1063/1.4962943 ↗
37. J. Nomoto, H. Makino, T. Yamamoto, J. Appl. Phys. 117, 045304–45311 (2015)10.1063/1.4906353 ↗
38. J. Nomoto, H. Makino, T. Yamamoto, Nanoscale Res. Lett. 11, 320–321 (2016)10.1186/s11671-016-1535-1 ↗
39. J. Nomoto, H. Makino, T. Yamamoto, Thin Solid Films 620, 2 (2016)10.1016/j.tsf.2016.07.078 ↗
40. J. Nomoto, K. Inaba, S. Kobayashi, H. Makino, T. Yamamoto, J. Crystal Growth 468, 645 (2017)10.1016/j.jcrysgro.2016.12.072 ↗
41. S.P. Chaudhuri, P. Sarkar, Ceram Int. 26, 865 (2000)10.1016/S0272-8842(00)00029-8 ↗
42. M.D. Ingram, Phys. Chem. Glasses 28, 215 (1987)
43. D.W. Richerson, Modern Ceramic Engineering, 2nd edn, vol. 47. (Marcel and Dekker Inc., New York, 1982)
44. R.A. Islam, Y.C. Chan, M.F. Islam, Mater. Sci. Eng. B 106, 132 (2004)10.1016/j.mseb.2003.09.005 ↗
45. S.P. Chaudhuri, P. Sarkar, A.K. Chakraborty, Ceram Int. 25, 91 (1999)10.1016/S0272-8842(98)00006-6 ↗