Fabrication of monolayer MoS2/rGO hybrids with excellent tribological performances through a surfactant-assisted hydrothermal route
Source abstract
Abstract
The extremely low friction between incommensurate two-dimensional (2D) atomic layers has recently attracted a great interest. Here, we demonstrated a promising surfactant-assisted strategy for the synthesis of MoS2/reduced graphene oxide (MoS2/rGO) hybrid materials with monolayer MoS2 and rGO, which exhibited excellent tribological metrics with a friction coefficient of ∼ 0.09 and a wear rate of ∼ 2.08 × 10−5 mm3/Nm in the ethanol dispersion. The incommensurate 2D atomic layer interface formed due to intrinsic lattice mismatch between MoS2 and graphene was thought to be responsible for the excellent lubricating performances. In addition to the benefits of unique hybrid structure, MoS2/rGO hybrids could also adsorb on metal surfaces and screen the metal–metal interaction to passivate the metal surfaces with a consequent reduction of corrosion wear during sliding. This work could pave a new pathway to design novel materials for pursuing excellent tribological properties by hybridizing different 2D atomic-layered materials.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: MXene and MAX Phase Materials · Graphene research and applications · 2D Materials and Applications
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References (31)
Show source-provided references
1. X. Li, Y. Gao, J. Xing, Y. Wang, L. Fang, Wear 257, 279 (2004)10.1016/j.wear.2003.12.012 ↗
2. D.H. Buckley, W.A. Brainar, Carbon 13, 501 (1975)10.1016/0008-6223(75)90052-4 ↗
3. W.O. Winer, Wear 10, 422 (1967)10.1016/0043-1648(67)90187-1 ↗
4. C. Lee, X. Wei, J.W. Kysar, J. Hone, Science 321, 385 (2008)10.1126/science.1157996 ↗
5. D. Berman, A. Erdemir, A.V. Sumant, Carbon 59, 167 (2013)10.1016/j.carbon.2013.03.006 ↗
6. P. Restuccia, M.C. Righi, Carbon 106, 118 (2016)10.1016/j.carbon.2016.05.025 ↗
7. J.M. Martin, C. Donnet, T.L. Mogne, T. Epicier, Phys. Rev. B 48, 10583 (1993)10.1103/PhysRevB.48.10583 ↗
8. T. Onodera, Y. Morita, R. Nagumo, R. Miura, A. Suzuki, H. Tsuboi, N. Hatakeyama, A. Endou, H. Takaba, F. Dassenoy, C. Minfray, L. Joly-Pottuz, M. Kubo, J.M. Martin, A. Miyamoto, J. Phys. Chem. B114, 15832 (2010)10.1021/jp1064775 ↗
9. H. Li, J. Wang, S. Gao, Q. Chen, L. Peng, K. Liu, X. Wei, Adv. Mater. 1701474 (2017)10.1002/adma.201701474 ↗
10. J. Shi, M. Liu, J. Wen, X. Ren, X. Zhou, Q. Ji, D. Ma, Y. Zhang, C. Jin, H. Chen, S. Deng, N. Xu, Z. Liu, Y. Zhang, Adv. Mater. 27, 7086 (2015)10.1002/adma.201503342 ↗
11. K. Hou, J. Wang, Z. Yang, L. Ma, Z. Wang, S. Yang, Carbon 115, 83 (2017)10.1016/j.carbon.2016.12.089 ↗
12. D. Chen, L. Li, L. Guo, Nanotechnology 22, 325601 (2011)10.1088/0957-4484/22/32/325601 ↗
13. J. Peng, J. Weng, Carbon 94, 568 (2015)10.1016/j.carbon.2015.07.035 ↗
14. G. Eda, H. Yamaguchi, D. Voiry, T. Fujita, M. Chen, M. Chhowalla, Nano Lett. 11, 5111 (2011)10.1021/nl201874w ↗
15. H. Li, Q. Zhang, C.C.R. Yap, B.K. Tay, T.H.T. Edwin, A. Olivier, D. Baillargeat, Adv. Funct. Mater. 22, 1385 (2012)10.1002/adfm.201102111 ↗
16. A. Molina-Sánchez, L. Wirtz, Phys. Rev. B 84, 155413 (2011)10.1103/PhysRevB.84.155413 ↗
17. K.G. Zhou, F. Withers, Y. Cao, S. Hu, G. Yu, C. Casiraghi, ACS Nano 8, 9914 (2014)10.1021/nn5042703 ↗
18. K.N. Kudin, B. Ozbas, H.C. .Schniepp, R.K. Prud’Homme, I.A. .Aksay, R. Car, Nano Lett. 8, 36 (2008)10.1021/nl071822y ↗
19. G. Huang, T. Chen, W. Chen, Z. Wang, K. Chang, L. Ma, F. Huang, D. Chen, J.Y. Lee, Small 9, 3693 (2013)10.1002/smll.201300415 ↗
20. Z. Wang, T. Chen, W. Chen, K. Chang, L. Ma, G. Huang, D. Chen, J.Y. Lee, J. Mater. Chem. A 1, 2202 (2013)10.1039/C2TA00598K ↗
21. K. Chang, W. Chen, L. Ma, H. Li, H. Li, F. Huang, Z. Xu, Q. Zhang, J.Y. Lee, J. Mater. Chem. 21, 6251 (2011)10.1039/c1jm10174a ↗
22. V. Dhandapani, E. Thangavel, M. Arumugam, K.S. Shin, V. Veeraraghavan, S.Y. Yau, C. Kim, D.E. Kim, Surf. Coat.Technol 240, 128 (2014)10.1016/j.surfcoat.2013.12.025 ↗
23. H.J. Kim, D.E. Kim, Sci. Rep 5, 17034 (2015)10.1038/srep17034 ↗
24. C. Lee, Q. Li, W. Kalb, X.Z. Liu, H. Berger, R.W. Carpick, J. Hone, Science 328, 76 (2010)10.1126/science.1184167 ↗
25. A.C. Ferrari, J. Robertson, Phys. Rev. B 61, 14095 (2000)10.1103/PhysRevB.61.14095 ↗
26. A.C. Ferrari, J. Robertson, Phys. Rev. B 64, 075414 (2001)10.1103/PhysRevB.64.075414 ↗
27. D. Pierucci, H. Henck, J. Avila, A. Balan, C.H. Naylor, G. Patriarche, Y.J. Dappe, M.G. Silly, F. Sirotti, A.T.C. Johnson, M.C. Asensio, A. Ouerghi, Nano Lett. 16, 4054 (2016)10.1021/acs.nanolett.6b00609 ↗
28. L.F. Wang, T.B. Ma, Y.Z. Hu, Q. Zheng, H. Wang, J. Luo, Nanotechnol. 25, 385701 (2014)10.1088/0957-4484/25/38/385701 ↗
29. A. Erdemir, G. Ramirez, O.L. Eryilmaz, B. Narayanan, Y. Liao, G. Kamath, S.K.R.S. Sankaranarayanan, Nature 536, 67 (2016)10.1038/nature18948 ↗
30. A.T. Alpas, H. Hu, J. Zhang, Wear 162–164, 188–195 (1993)10.1016/0043-1648(93)90500-L ↗
31. A.R. Konicek, D.S. Grierson, P. Gilbert, W.G. Sawyer, A.V. Sumant, R.W. Carpick, Phys. Rev. Lett. 100, 235502 (2008)10.1103/PhysRevLett.100.235502 ↗