journal article·2006-02

Residual thermal effects in Al following single ns- and fs-laser pulse ablation

A.Y. Vorobyev, V.M. Kuzmichev, N.G. Kokody, P. Kohns, J. Dai, Chunlei Guo

Applied Physics A· Volume 82· Issue 2
Publisher page

Abstract

A comparative study of residual thermal effects in aluminum following ns- and fs-laser ablation shows a surprisingly similar trend in their behavior, despite many differences between ns and fs laser-matter interactions. At laser fluences above the ablation threshold where plasmas are produced and at a sufficiently high ambient gas pressure, an enhanced coupling of pulsed laser energy to the sample occurs. This effect appears to be a universal phenomenon for both ns- and fs-laser ablation in gas media. Furthermore, in contrast to the common belief that residual thermal energy is negligible in fs-laser ablation, our study shows that up to 70% of the incident pulse energy can be retained in the sample following single-pulse fs-laserablation in 1-atm air. In both ns- and fs-laser ablation, the major factors governing thermal energy coupling to the sample are the laser fluence and ambient gas pressure. Residual thermal energy deposition decreases with reducing ambient gas pressure.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Laser-induced spectroscopy and plasma · Laser Material Processing Techniques · Integrated Circuits and Semiconductor Failure Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (24)

Show source-provided references
1. Bäuerle D (2000) Laser Processing and Chemistry, 3rd edn. Springer, Berlin10.1007/978-3-662-04074-4 ↗
2. Hubler GK, Chrisey DB (eds) (1994) Pulsed Laser Deposition of Thin Films. Wiley, New York
3. Russo RE (1995) Appl. Spectrosc. 49:A1410.1366/0003702953965399 ↗
4. Geohegan DB, Puretzky AA, Duscher G, Pennycook SJ (1999) Appl. Phys. Lett. 72:298710.1063/1.121516 ↗
5. Chichkov BN, Momma C, Nolte S, von Alvensleben F, Tunnermann A (1996) Appl. Phys. A 63:10910.1007/BF01567637 ↗
6. Semerok A, Chaleard C, Detaille V, Lacour J-L, Mauchin P, Meynadier P, Nouvellon C, Salle B, Palianov P, Perdrix M, Petite G (1999) Appl. Surf. Sci. 138–139:31110.1016/S0169-4332(98)00411-5 ↗
7. Le Harzic R, Huot N, Audouard E, Jonin C, Laporte P, Valette S, Fraczkiewicz A, Fortunier R (2002) Appl. Phys. Lett. 80:388610.1063/1.1481195 ↗
8. Margetic V, Pakulev A, Stockhaus A, Bolshov M, Niemax K, Hergenröder R (2000) Spectrochim. Acta B 55:177110.1016/S0584-8547(00)00275-5 ↗
9. Marcus S, Lowder JE, Mooney DL (1976) J. Appl. Phys. 47:296610.1063/1.323035 ↗
10. Maher WE, Hall RB (1977) J. Appl. Phys. 49:225410.1063/1.325132 ↗
11. McKay JA, Bleach RD, Nagel DJ, Schriemph JT, Hall RB, Pond CR, Manlief SK (1979) J. Appl. Phys. 50:323110.1063/1.326361 ↗
12. Golodenko NN, Vorobyev AY, Kuzmichev VM, Guzhva VG (1976) Radiotekhnika (Kharkov) 38:138 (in Russian)
13. Vorobyev AY, Kuzmichev VM (1980) Sov. J. Quantum Electron. 10:10310.1070/QE1980v010n01ABEH009867 ↗
14. Vorobyev AY (1985) Sov. J. Quantum Electron. 15:49010.1070/QE1985v015n04ABEH006963 ↗
15. Vorobyev AY, Guo C (2005) Appl. Phys. Lett. 86:01191610.1063/1.1844598 ↗
16. Pronko PP, Dutta SK, Du D, Singh RK (1995) J. Appl. Phys. 78:623310.1063/1.360570 ↗
17. Maher WE, Nichols DB, Hall RB (1980) Appl. Phys. Lett. 37:1210.1063/1.91676 ↗
18. Rosen DI, Mitteldorf J, Kothandaraman G, Pirri AN, Pugh ER (1982) J. Appl. Phys. 53:319010.1063/1.331018 ↗
19. Gray DE (ed) (1972) American Institute of Physics Handbook, 3rd edn. McGraw-Hill, New York
20. von Allmen M (1987) Laser-Beam Interactions with Materials. Springer-Verlag, Heidelberg10.1007/978-3-642-97007-8 ↗
21. Radziemski LJ, Cremers DA (eds) (1989) Laser-Induced Plasmas and Applications. Marcel Dekker Inc., New York
22. Fox M (2001) Optical Properties of Solids. Oxford University Press, New York
23. Ready JF (1971) Effects of High-Power Laser Radiation. Academic Press, New York
24. Le Drogoff B, Vidal F, von Kaenel Y, Chaker M, Johnston TW, Laville S, Sabsabi M, Margot J (2001) J. Appl. Phys. 89:824710.1063/1.1370361 ↗