Crystallographically-oriented single-crystalline copper nanowire arrays electrochemically grown into nanoporous anodic alumina templates
Source abstract
Abstract
Highly crystallographically-oriented single-crystalline copper nanowire arrays were electrochemically deposited into nanoporous commercial alumina templates. A gold/copper backward contact was needed in the template, while the nanowires were grown from a 0.5 M CuSO4·5H2O solution adjusted to pH=1. The kinetics of the growing process is studied by means of current vs. time curves. The pore filling is between 80 to 90%. The structure and morphology of the wires are studied by XRD, SEM and TEM. The wires have an average diameter of 150 nm corresponding to the pore diameter of the template, with the cubic face-centered copper structure. This structure is highly oriented along the [100] direction parallel to the wire axis. The preferential growing along this direction was not previously found in the literature, which may have interesting applications when such direction is required.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Anodic Oxide Films and Nanostructures · Nanoporous metals and alloys · Electrodeposition and Electroless Coatings
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (78)
Show source-provided references
1. M.S. Dresselhaus, Y.M. Lin, O. Rabin, M.R. Black, G. Dresselhaus: Nanowires, In Springer Handbook of Nanotechnology, ed. by B. Bhushan, (Springer, Berlin 2004) p. 9910.1007/3-540-29838-X_4 ↗
2. P. Yang, Y. Wu, R. Fang: Int. J. Nanoscience 1, 1 (2002)10.1142/S0219581X02000061 ↗
3. M. Dresselhaus, Y.M. Lin, O. Rabin, A. Jorio, A.G. Souza Filho, M.A. Pimenta, R. Saito, Ge.G. Samsonidze, G. Dresselhaus: Mater. Sci. Eng. C 23, 129 (2003)10.1016/S0928-4931(02)00240-0 ↗
4. I.W. Hamley: Angew. Chem. Int. Ed. 42, 1692 (2003)10.1002/anie.200200546 ↗
5. C.J. Murphy, N.R. Jana: Adv. Mater. 14, 80 (2002)10.1002/1521-4095(20020104)14:1<80::AID-ADMA80>3.0.CO;2-# ↗
6. D. Xu, D. Chen, Y. Xu, X. Shi, G. Guo, L. Gui, Y. Tang: Pure Appl. Chem. 72, 127 (2000)10.1351/pac200072010127 ↗
7. F. Elhoussine, S. Matefi-Tempfli, A. Encinas, L. Piraux: Appl. Phys. Lett. 81, 1681 (2002)10.1063/1.1503400 ↗
8. F. Elhoussine, A. Encinas, S. Matefi-Tempfli, L. Piraux: J. Appl. Phys. 93, 8567 (2003)10.1063/1.1557341 ↗
9. J.B. Pendry, A.J. Holden, W.J. Stewart, I. Youngs: Phys. Rev. Lett. 76, 4773 (1996)10.1103/PhysRevLett.76.4773 ↗
10. N. Garcia, E.V. Ponizovskaya, J.Q. Xiao: Appl. Phys. Lett. 80, 1120 (2002)10.1063/1.1449529 ↗
11. L.-Ming Li, Z.-Qing Zhang, X. Zhang: Phys. Rev. B 58, 15589 (1998)10.1103/PhysRevB.58.15589 ↗
12. N. Garcia, E.V. Ponizowskaya, H. Zhu, J.Q. Xiao, A. Pons: Appl. Phys. Lett. 82, 3147 (2003)10.1063/1.1569656 ↗
13. R.J. Walsh, G. Chumanov: Appl. Spectrosc. 55, 1695 (2001)10.1366/0003702011954035 ↗
14. A.I. Yanson, G.R. Bollinger, H.E. van den Brom, N. Agrait, J.M. van Ruitenbeek: Nature 395, 783 (1998)10.1038/27405 ↗
15. J. Malicka, I. Gryczynski, J. Kusba, Y.B. Shen, J.R. Lakowicz: Biochem. Biophys. Res. Commun. 294, 886 (2002)10.1016/S0006-291X(02)00555-7 ↗
16. D.H. Reich, M. Tanase, A. Hultgren, L.A. Bauer, C.S. Chen, G.J. Meyer: J. Appl. Phys. 93, 7275 (2003)10.1063/1.1558672 ↗
17. G. Yi, W. Schwarzacher: Appl. Phys. Lett. 74, 1746 (1999)10.1063/1.123675 ↗
18. M. Tian, J. Wang, J. Snyder, J. Kurtz, Y. Liu, P. Schiffer, T.E. Mallouk, M.H.W. Chan: Appl. Phys. Lett. 83, 1620 (2003)10.1063/1.1601692 ↗
19. K. Liu, C.L. Chien, P.C. Searson, K. Yu-Zhang: Appl. Phys. Lett. 73, 1436 (1998)10.1063/1.122378 ↗
20. J. Heremans, C.M. Thrush, Y-M. Ling, S. Cronin, Z. Zhang, M.S. Dresselhaus, J.F. Mansfield: Phys. Rev. B 61, 2921 (2000)10.1103/PhysRevB.61.2921 ↗
21. Y-G. Guo, L-J. Wan, C-F. Zhu, D-L. Yang, D-M. Chen, C-L. Bai: Chem. Mater. 15, 664 (2003)10.1021/cm0208962 ↗
22. G.A. Prinz: Science 282, 1660 (1998)10.1126/science.282.5394.1660 ↗
23. F. Li, R.M. Metzger, W.D. Doyle: IEEE Trans. Mag. 33, 3715 (1997)10.1109/20.619548 ↗
24. C.L. Chien, L. Sun, M. Tanase, L.A. Bauer, A. Hultgren, D.M. Silevitch, G.J. Meyer, P.C. Searson, D.H. Reich: J. Magn. Mag. Mat. 249, 146 (2002)10.1016/S0304-8853(02)00523-1 ↗
25. D.N. Davydov, P.A. Sattari, D. Almawlawi, A. Osika, T.L. Haslett, M. Moskovits: J. Appl. Phys. 86, 3983 (1999)10.1063/1.371317 ↗
26. M. Martín-González, A.L. Prieto, M.S. Kox, R. Gronsky, T. Sands, A.M. Stacy: Chem. Mater. 15, 1676 (2003)10.1021/cm021027f ↗
27. M.S. Dresselhaus, Y.M. Lin, O. Rabin, M.R. Black, G. Dresselhaus: Nanowires, In Springer Handbook of Nanotechnology, ed. by B. Bhushan, (Springer, Berlin 2004) p. 13110.1007/3-540-29838-X_4 ↗
28. Y.T. Pang, G.W. Meng, Y. Zhang, Q. Fang, L.D. Zhang: Appl. Phys. A 76, 533 (2003)10.1007/s00339-002-1483-8 ↗
29. J. Choi, G. Sauer, K. Nielsch, R.B. Wehrspohn, U. Gösele: Chem. Mater. 15, 776 (2003)10.1021/cm0208758 ↗
30. A.C. Gâlcâ, E. Stefan Kooij, H. Wormeester, C. Salm, V. Leca, J.H. Rector, B. Poelsema: J. Appl. Phys. 94, 4296 (2003)10.1063/1.1604951 ↗
31. F. Genereux, S.W. Leonard, H.M. van Driel: Phys. Rev. B 63, 161101 (2001)10.1103/PhysRevB.63.161101 ↗
32. W.C. West, N.V. Myung, J.F. Whitacre, B.V. Ratnakumar: J. Power Sources 126, 203, 200410.1016/j.jpowsour.2003.08.020 ↗
33. D.J. Pena, B. Razavi, P.A. Smith, J.K. Mdindyo, M.J. Natan, T.S. Mayer, T.E. Mallouk, C.D. Keating: Mat. Res. Soc. Symp. 636, D.4.6.1 (2001)10.1557/PROC-636-D4.6.1 ↗
34. G.M. Wallraff, W.D. Hinsberg: Chem. Rev. 99, 1801 (1999)10.1021/cr980003i ↗
35. R.M. Nyffenegger, R.M. Penner: Chem. Rev. 97, 1195 (1997)10.1021/cr960069i ↗
36. S.H. Sun, C.B. Murray, D. Weller, L. Folks, A. Moser: Science 287, 1989 (2000)10.1126/science.287.5460.1989 ↗
37. F. Sharifi, A.V. Herzog, R.C. Dynes: Phys. Rev. Lett. 71, 428 (1993) and references therein10.1103/PhysRevLett.71.428 ↗
38. M.E. Tomil Molares, J. Brötz, V. Buschmann, D. Dobrev, R. Neumann, R. Scholz, I.U. Schuchert, C. Trautmann, J. Vetter: Nucl. Instrum. Methods Phys. Res., Sect. B 185, 192 (2001)10.1016/S0168-583X(01)00755-8 ↗
39. G.E. Possin: Rev. Sci. Instrum. 41, 772 (1970)10.1063/1.1684640 ↗
40. C.R. Martin: Science 266, 1961 (1994)10.1126/science.266.5193.1961 ↗
41. A. Huczko: Appl. Phys. A 70, 365 (2000)10.1007/s003390051050 ↗
42. I.U. Schuchert, M.E. Toimil Molares, D. Dobrev, J. Vetter, R. Neumann, M. Martin: J. Electrochem. Soc. 150, C189 (2003)10.1149/1.1554722 ↗
43. S. Ge, C. Li, X. Ma, W. Li, L. Xi, C.X. Li: J. Appl. Phys. 90, 509 (2001)10.1063/1.1327599 ↗
44. I. Enculescu, Z. Siwy, D. Dobrev, C. Trautmann, M.E. Toimil Molares, R. Neumann, K. Hjort, L. Westerberg, R. Spohr: Appl. Phys. A 77, 751 (2003)10.1007/s00339-003-2216-3 ↗
45. H. Masuda, M. Satoh: Jpn. J. Appl. Phys. 35, L 126 (1996)10.1143/JJAP.35.L126 ↗
46. A-P. Li, F. Müller, A. Birner, K. Nielsch, U. Gösele: Adv. Mater. 11, 483 (1999)10.1002/(SICI)1521-4095(199904)11:6<483::AID-ADMA483>3.0.CO;2-I ↗
47. G.D. Sulka, S. Stroobants, V. Moshchalkov, G. Borghs, J.-P. Cellis: J. Electrochem. Soc. 149, D97 (2002)10.1149/1.1481527 ↗
48. T. Thurn-Albrecht, J. Schotter, G.A. Kästle, N. Emley, T. Shibauchi, L. Krusin;Elbaum, K. Guarini, C.T. Black, M.T. Tuominen, T.P. Russell: Science 290, 2126 (2000)10.1126/science.290.5499.2126 ↗
49. R.M. Metzger, V.V. Konovalov, M. Sun, T. Xu, G. Zangari, B. Xu, M. Benakli, W.D. Doyle: IEEE Trans. Magn. 36, 30 (2000)10.1109/20.824421 ↗
50. Y. Li, G.W. Meng, L.D. Zhang, F. Phillipp: Appl. Phys. Lett. 76, 2011 (2000)10.1063/1.126238 ↗
51. M. Zhang, S. Lenhert, M. Wang, L. Chi, N. Lu, H. Fuchs, N. Ming: Adv. Mater. 16, 409 (2004)10.1002/adma.200305577 ↗
52. H. He, N.J. Tao: Encyclopedia of Nanoscience and Nanotechnology, ed. by H.S. Nalwa, Vol. X, p. 1–18, Copyright Am. Scientific Publishers, 2003
53. S. Krongelb, L.T. Romankiw, J.A. Tornello: IBM J. Res. Dev. 42, 575 (1998)10.1147/rd.425.0575 ↗
54. Z. Liu, Y. Bando: Adv. Mater. 15, 303, 200310.1002/adma.200390073 ↗
55. I.Z. Rahman, K.M. Razeeb, M.A. Rahman, Md. Kamruzzaman: J. Magn. Magn. Mater. 262, 166 (2003)10.1016/S0304-8853(03)00043-X ↗
56. Y. Henry, K. Ounadjela, L. Piraux, S. Dubois, J.-M. George, J.-L. Duvail: Eur. Phys. J. B. 20, 35, 200110.1007/s100510170283 ↗
57. H. Schwanbeck, U. Schmidt: Electrochim. Acta 45, 4389 (2000)10.1016/S0013-4686(00)00502-8 ↗
58. C. Schönenberger, B.M. van der Zande, L.G.J. Fokking, M. Henry, C. Schimd, M. Krüger, A. Bachtold, R. Huber, H. Birk, U. Staufer: J. Phys. Chem. 101, 5497 (1997)10.1021/jp963938g ↗
59. S. Leopold, I.U. Schuchert, J. Lu, M.E. Toimil Molares, M. Herranen, J.O. Carlsson: Electrochim. Acta 47, 4393 (2002)10.1016/S0013-4686(02)00515-7 ↗
60. M.E. Toimil Molares, V. Buschmann, D. Dobrev, R. Neumann, R. Scholz, I.U. Schuchert, J. Vetter: Adv. Mater. 13, 62 (2001)10.1002/1521-4095(200101)13:1<62::AID-ADMA62>3.3.CO;2-Z ↗
61. S. Valizadeh, J.M. George, P. Leisner, L. Hultman: Thin Solid Films 402, 262 (2002)10.1016/S0040-6090(01)01674-1 ↗
62. A. Kazadi Mukenga Bantu, J. Rivas, G. Zaragoza, M.A. López-Quintela, M.C. Blanco: J. Appl. Phys. 89, 3393 (2001)10.1063/1.1345857 ↗
63. M.S. Sander, R. Gronsky, T. Sands, A.M. Stacy: Chem. Mater. 15, 335 (2003)10.1021/cm0207604 ↗
64. A.L. Prieto, M.S. Sander, M.S. Martín-González, R. Gronsky, T. Sands, A.M. Stacy: J. Am. Chem. Soc. 123, 7160 (2001)10.1021/ja015989j ↗
65. C.G. Jin, W.F. Liu, C. Jia, X.Q. Xiang, W.L. Cai, L.Z. Yao, X.G. Li: J. Crystal. Growth 258, 337 (2003)10.1016/S0022-0248(03)01542-2 ↗
66. D. Routkevitch, T. Bigioni, M. Moskovits, J. Ming Xu: J. Phys. Chem. 100, 14037 (1996)10.1021/jp952910m ↗
67. JCPDS Copper, File 04-836
68. Y.C. Wang, I.C. Leu, M.H. Hon: J. Appl. Phys. 95, 1444 (2004)10.1063/1.1637710 ↗
69. G.B. Harris: Phil. Mag. 43, 113 (1952)10.1080/14786440108520972 ↗
70. T. Gao, G.W. Meng, J. Zhang, Y.W. Wang, C.H. Liang, J.C. Fan, L.D. Zhang: Appl. Phys. A 73, 251 (2001)10.1007/s003390100910 ↗
71. T. Gao, G. Meng, Y. Wang, S. Sun, L. Zhang: J. Phys. Condens. Matter 14, 355 (2002)10.1088/0953-8984/14/3/306 ↗
72. H.H. Huang, M.H. Hon, M.C. Wang: J. Cryst. Growth 240, 513 (2002), and references therein10.1016/S0022-0248(02)01081-3 ↗
73. J.S. Chen, B.C. Lim, J.P. Wang: Appl. Phys. Lett. 81, 1848 (2002)10.1063/1.1504489 ↗
74. J.M.E. Harper, C. Cabral Jr., P.C. Andricacos, L. Gignac, I.C. Noyan, K.P. Rodbell, C.K. Hu: J. Appl. Phys. 86, 2516 (1999)10.1063/1.371086 ↗
75. S-C. Chang, J-M. Shieh, B-T. Dai, M-S. Feng, Y-H. Li: J. Electrochem. Soc. 149, G535 (2002)10.1149/1.1500348 ↗
76. X.F. Wang, J. Zhang, H.Z. Shi, Y.W. Wang, G.W. Meng, X.S. Peng, J. Fang: J. Appl. Phys. 89, 3847 (2001)10.1063/1.1352562 ↗
77. X.Y. Zhang, L.D. Zhang, Y. Lei, L.X. Zhao, Y.Q. Mao: J. Mater. Chem. 11, 1732 (2001)10.1039/b100552i ↗
78. J. Diao, K. Gall, M.L. Dunn: Phys. Rev. B 70, 075413-1 (2004)10.1103/PhysRevB.70.075413 ↗