Diffusion-limited photopolymerization in scanning micro-stereolithography
Source abstract
Abstract
The trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nonlinear Optical Materials Studies · Photopolymerization techniques and applications · Nanofabrication and Lithography Techniques
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References (18)
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