Towards the implanting of ions and positioning of nanoparticles with nm spatial resolution
Source abstract
Abstract
Decreasing structure sizes in both conventional and quantum solid state devices require novel fabrication methods: we present a technology which allows to implant ions through a small hole in the tip of an atomic force microscope. This technique offers a maskless addressing of small structures using different projectiles at kinetic energies between 0.5 and 5.0 keV. Our method aims to implant single atomic ions, molecular ions or charged nanoparticles with nm resolution. We test the method by implanting N+ ions into diamond and generating nitrogen-vacancy color centers. The system is operated with a conventional ion gun. However, in future we will employ an ion trap as a deterministic source of cold single ions.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Ion-surface interactions and analysis · High-pressure geophysics and materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (22)
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