Detection of hydrogen at room temperature with catalyst-coated multiple ZnO nanorods
Source abstract
Abstract
A variety of different metal catalyst coatings (Pt, Pd, Au, Ag, Ti and Ni) deposited on multiple ZnO nanorods have been compared for their effectiveness in enhancing sensitivity for detecting hydrogen at room temperature. Pt-coated nanorods show a relative response of up to 8% in room-temperature resistance upon exposure to a hydrogen concentration in N2 of 500 ppm. This is a factor of two larger than that obtained with Pd and more than an order of magnitude larger than that achieved with the remaining metals. The power levels for these sensors were low, ∼0.4 mW for the responses noted above. Pt-coated ZnO nanorods easily detected hydrogen down to 100 ppm, with a relative response of 4% at this concentration after 10-min exposure. The nanorods show a return to their initial conductance upon switching back to a pure-air ambient with time constants of the order of a few minutes at room temperature. This slow response at room temperature is a drawback in some applications, but the sensors do offer low-power operation and ppm detection sensitivity.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Gas Sensing Nanomaterials and Sensors · Air Quality Monitoring and Forecasting · Analytical Chemistry and Sensors
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (32)
Show source-provided references
1. G.W. Hunter, P.G. Neudeck, R.S. Okojie, G.M. Beheim, V. Thomas, L. Chen, D. Lukco, C.C. Liu, B. Ward, D. Makel: Proc. Electrochem. Soc. 1–2, 212 (2002)
2. L.Y. Chen, G.W. Hunter, P.G. Neudeck, D.L. Knight, C.C. Liu, Q.H. Wu: in Proc. Third Int. Symp. Ceramic Sensors, ed. by H.U. Anderson, M. Liu, N. Yamazoe (Electrochemical Society, Pennington, NJ 1996) p. 92
3. G.W. Hunter, C.C. Liu, D. Makel: in MEMS Handbook, ed. by M.G. Hak (CRC, Boca Raton, FL 2001) p. 107
4. L. Chen, G.W. Hunter, P.G. Neudeck: J. Vac. Sci. Technol. A 15, 1228 (1997); J. Vac. Sci. Technol. A 16, 2890 (1998)10.1116/1.580600 ↗
5. G.W. Hunter, P.G. Neudeck, R.S. Okojie, G.M. Beheim, V. Thomas, L. Chen, D. Lukco, C.C. Liu, B. Ward, D. Makel: Electrochem. Soc. Proc. 3, 93 (2002)
6. Y. Lu, J. Li, H.T. Ng, C. Binder, C. Partridge, M. Meyyapan: Chem. Phys. Lett. 391, 344 (2004)10.1016/j.cplett.2004.05.029 ↗
7. I. Sayago, E. Terrado, E. Lafuente, M.C. Horillo, W.K. Maser, A.M. Benito, R. Navarro, E.P. Urriolabeita, M.T. Martinez, J. Gutierrez: Synth. Met. 148, 15 (2005)10.1016/j.synthmet.2004.09.013 ↗
8. B.S. Kang, F. Ren, Y.W. Heo, L.C. Tien, D.P. Norton, S.J. Pearton: Appl. Phys. Lett. 86, 112105 (2005)10.1063/1.1883330 ↗
9. Q. Wan, Q.H. Li, Y.J. Chen, T.H. Wang, X.L. He, J.P. Li, C.L. Lin: Appl. Phys. Lett. 84, 3654 (2004)10.1063/1.1738932 ↗
10. Q. Wan, Q.H. Li, Y.J. Chen, T.H. Wang, X.L. He, X.G. Gao, J.P. Li: Appl. Phys. Lett. 84, 3654 (2004)10.1063/1.1738932 ↗
11. K. Keem, H. Kim, G.T. Kim, J.S. Lee, B. Min, K. Cho, M.Y. Sung, S. Kim: Appl. Phys. Lett. 84, 4376 (2004)10.1063/1.1756205 ↗
12. M.H. Huang, S. Mao, H. Feick, H. Yan, Y. Wu, H. Kind, E. Weber, R. Russo, P. Yang: Science 292, 1897 (2001)10.1126/science.1060367 ↗
13. Z.L. Wang: Mater. Today 7, 26 (2004)10.1016/S1369-7021(04)00286-X ↗
14. Y.W. Heo, D.P. Norton, L.C. Tien, Y. Kwon, B.S. Kang, F. Ren, S.J. Pearton, J.R. LaRoche: Mater. Sci. Eng. R 47, 1 (2004)10.1016/j.mser.2004.09.001 ↗
15. C.H. Liu, W.C. Liu, F.C.K. Au, J.X. Ding, C.S. Lee, S.T. Lee: Appl. Phys. Lett. 83, 3168 (2003)10.1063/1.1609232 ↗
16. W.I. Park, G.C. Yi, J.W. Kim, S.M. Park: Appl. Phys. Lett. 82, 4358 (2003)10.1063/1.1584089 ↗
17. H.T. Ng, J. Li, M.K. Smith, P. Nguygen, A. Cassell, J. Han, M. Meyyappan: Science 300, 1249 (2003)10.1126/science.1082542 ↗
18. W.I. Park, G.C. Yi, M.Y. Kim, S.J. Pennycook: Adv. Mater. 15, 526 (2003)10.1002/adma.200390122 ↗
19. P.J. Poole, J. Lefebvre, J. Fraser: Appl. Phys. Lett. 83, 2055 (2003)10.1063/1.1608486 ↗
20. M. He, M.M.E. Fahmi, S. Noor Mohammad, R.N. Jacobs, L. Salamanca-Riba, F. Felt, M. Jah, A. Sharma, D. Lakins: Appl. Phys. Lett. 82, 3749 (2003)10.1063/1.1578519 ↗
21. X.C. Wu, W.H. Song, W.D. Huang, M.H. Pu, B. Zhao, Y.P. Sun, J.J. Du: Chem. Phys. Lett. 328, 5 (2000)10.1016/S0009-2614(00)00899-X ↗
22. M.J. Zheng, L.D. Zhang, G.H. Li, X.Y. Zhang, X.F. Wang: Appl. Phys. Lett. 79, 839 (2001)10.1063/1.1389071 ↗
23. B.P. Zhang, N.T. Binh, Y. Segawa, K. Wakatsuki, N. Usami: Appl. Phys. Lett. 83, 1635 (2003)10.1063/1.1605803 ↗
24. W.I. Park, Y.H. Jun, S.W. Jung, G. Yi: Appl. Phys. Lett. 82, 964 (2003)10.1063/1.1544437 ↗
25. Z.W. Pan, Z.R. Dai, Z.L. Wang: Science 291, 1947 (2001)10.1126/science.1058120 ↗
26. J.Y. Lao, J.Y. Huang, D.Z. Wang, Z.F. Ren: Nano Lett. 3, 235 (2003)10.1021/nl025884u ↗
27. See the databases at http://www.rebresearch.com/H2perm2.htm and http://www.rebresearch.com/H2sol2.htm
28. W. Eberhardt, F. Greunter, E.W. Plummer: Phys. Rev. Lett. 46, 1085 (1981)10.1103/PhysRevLett.46.1085 ↗
29. A.A. Tomchenko, G.P. Harmer, B.T. Marquis, J.W. Allen: Sens. Actuators B 93, 126 (2003)10.1016/S0925-4005(03)00240-5 ↗
30. K.D. Mitzner, J. Sternhagen, D.W. Galipeau: Sens. Actuators B 93, 92 (2003)10.1016/S0925-4005(03)00244-2 ↗
31. P. Mitra, A.P. Chatterjee, H.S. Maiti: Mater. Lett. 35, 33 (1998)10.1016/S0167-577X(97)00215-2 ↗
32. J.F. Chang, H.H. Kuo, I.C. Leu, M.H. Hon: Sens. Actuators B 84, 258 (1994)10.1016/S0925-4005(02)00034-5 ↗