journal article·2005-11

Pulse width effect in ultrafast laser processing of materials

C.Y. Chien, M.C. Gupta

Applied Physics A· Volume 81· Issue 6
Publisher page

Abstract

A systematic study of the influence of laser pulse width in ultrafast laser micromachining of silicon and stainless steel was carried out. Experiments were performed using a Ti:sapphire laser with 800 nm and 400 nm (frequency doubling) wavelengths in an air environment with a pulse duration ranging from 110 fs to 10 ps. Hole drilling and line cutting of silicon and stainless steel were studied. Structural details of the machined area were characterized using a number of techniques such as optical microscopy, atomic force microscopy and stylus profilometry. The effect of pulse width on melting was observed at ∼2.5 ps for stainless steel and at ∼5 ps for silicon. Also, the polarization effect on the laser machining is reported. The machined quality using femtosecond laser pulses with high energy fluence was found to be limited by the laser intensity contrast.
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Research context

OpenAlex topics: Laser Material Processing Techniques · Ocular and Laser Science Research · Advanced Surface Polishing Techniques

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References (31)

Show source-provided references
1. D. Bauerle: Laser processing and Chemistry, 3rd edn. (Springer-Verlag, Berlin, Heidelberg 2000)10.1007/978-3-662-04074-4 ↗
2. W.M. Steen: Laser Material processing, 2nd edn. (Springer-Verlag, London 1998)10.1007/978-1-4471-3609-5 ↗
3. J. Ihlemann, A. Scholl, H. Schmidt, B. Wolff-Rottke: Appl. Phys. A 60, 411 (1995)10.1007/BF01538343 ↗
4. P.P. Pronko, S.K. Dutta, J. Squier, J.V. Rudde, D. Du, G. Mourou: Opt. Commun. 114, 106 (1995)10.1016/0030-4018(94)00585-I ↗
5. D. Ashkenasi, A. Rosenfeld, H. Varel, M. Wahmer, E.E.B. Campbell: Appl. Surf. Sci. 120, 65 (1997)10.1016/S0169-4332(97)00218-3 ↗
6. M.D. Perry, B.C. Stuart, P.S. Banks, M.D. Feit, V. Yanovsky, A.M. Rubenchik: J. Appl. Phys. 85, 6803 (1999)10.1063/1.370197 ↗
7. S. Nolte, G. Kamlage, F. Korte, T. Bauer, T. Wagner, A. Ostendorf, C. Fallnich, H. Welling: Adv. Eng. Mater. 2, 23 (2000)10.1002/(SICI)1527-2648(200002)2:1/2<23::AID-ADEM23>3.0.CO;2-L ↗
8. N. Barsh, K. Korrber, A. Ostendorh, K.H. Tonshoff: Appl. Phys. A 77, 237 (2003)10.1007/s00339-003-2118-4 ↗
9. R.F.W. Herrmann, J. Gerlach, E.E.B. Campbell: Appl. Phys. A 66, 35 (1998)10.1007/s003390050634 ↗
10. V. Hertel, R. Stoian, A. Rosenfeld, D. Ashkenasi, E.E.B. Campbell: Riken Review 32, 23 (2001)
11. A.A. Bugayev, M.C. Gupta: Opt. Lett. 28, 1463 (2003)10.1364/OL.28.001463 ↗
12. M. El-Bandrawy, K. Nagarathnam, M.C. Gupta, C. Hamann, J. Horsting: J. Laser Appl. 15, 101 (2003)10.2351/1.1536647 ↗
13. M. El-Bandrawy, M.C. Gupta: Proc. SPIE 4977, 219 (2003)10.1117/12.479556 ↗
14. X.Y. Wang, D.M. Riffe, Y.S. Lee, M.C. Downer: Phys. Rev. B 50, 8016 (1994)10.1103/PhysRevB.50.8016 ↗
15. R.W. Schoenlein, W.Z. Lin, J.G. Fujimoto, G.L. Eesley: Phys. Rev. Lett. 58, 1680 (1987)10.1103/PhysRevLett.58.1680 ↗
16. W.S. Fann, R. Storz, H.W. K Tom, J. Bokor: Phys. Rev. B 46, 13592 (1992)10.1103/PhysRevB.46.13592 ↗
17. W. Kautek, J. Kruger: Proc. SPIE 2207, 600 (1994)10.1117/12.184768 ↗
18. S. Preuss, A. Demchuk, M. Stuke: Appl. Phys. A 61, 33 (1995)10.1007/BF01538207 ↗
19. B.N. Chichkov, C. Momma, S. Notle, F. Alvensleben, A. Tünnermann: Appl. Phys. A 63, 109 (1996)10.1007/BF01567637 ↗
20. P.S. Banks, D.D. Feit, A.M. Rubenchik, B.C. Stuart, M.D. Perry: Appl. Phys. A 69, S377 (1999)10.1007/s003390051420 ↗
21. M.M. Murnanem H.C. Kapteyn, R.M.W. Falcone: Phys. Rev. Lett. 62, 155 (1989)10.1103/PhysRevLett.62.155 ↗
22. J. Queneuille, F. Druon, A. Maksimchuk, G. Cheriaux, G. Mourou, K. Nemoto: Opt. Lett. 25, 508 (2000)10.1364/OL.25.000508 ↗
23. J.Y. Zhang, J. Huang, H. Wang, K.S. Wong, G.K. Wong: J. Opt. Soc. Am. B 15, 200 (1998)10.1364/JOSAB.15.000200 ↗
24. Y. Tamaki, M. Obara, K. Midorikawa: Jpn. J. Appl. Phys. 37, 4801 (1998)10.1143/JJAP.37.4801 ↗
25. G. Albrecht, A. Antnetti, G. Mourou: Opt. Commun. 40, 59 (1981)10.1016/0030-4018(81)90271-6 ↗
26. S. Nolte, C. Momma, G. Kamlage, A. Ostendorf, C. Fallnich, F. von Alvensleben, H. Welling: Appl. Phys. A 68, 563 (1999)10.1007/s003390050941 ↗
27. H.K. Tonshoff, A. Ostendorf, T. Wagner: Proc. SPIE 4274, 88 (2001)10.1117/12.432500 ↗
28. K. Venkatakrishnan, B. Tan, P. Stanley, N.R. Sivakumar: J. Appl. Phys. 92, 1604 (2002)10.1063/1.1487453 ↗
29. K. Fargoo, A. Kar: J. Appl. Phys. 83, 7467 (1998)10.1063/1.367509 ↗
30. A. Siegman: Lasers (University Science Books, Mill Valley, CA 1986) pp. 385
31. E.T.J. Nibbering, G. Grillon, M.A. Franco, F.S. Prade, A. Mysyrowicz: J. Opt. Soc. Am. B 14, 650 (1997)10.1364/JOSAB.14.000650 ↗