Oxygen diffusion through thin Pt films on Si(100)
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OpenAlex topics: Semiconductor materials and devices · Surface and Thin Film Phenomena · Semiconductor materials and interfaces
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References (34)
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1. A. Czernik, H. Palm, W. Cabanski, M. Schulz, U. Suckow: Appl. Phys. A55, 180 (1992)10.1007/BF00334221 ↗
2. B. Y. Tsaur, C. K. Chen, J.-P. Mattia: IEEE Electron. Dev. Lett.11, 162 (1990)10.1109/55.61783 ↗
3. M. Kimata, N. Yutani, N. Tsubouchi, T. Seto: SPIE Proc.1762, 350 (1992)10.1117/12.138975 ↗
4. T. L. Lin, J. Park, T. George, E. W. Jones: IEEE Trans. ED-40, 2143 (1993)
5. G. Ottaviani, K. N. Tu, J. W. Mayer: Phys. Rev. B24, 3354 (1981)10.1103/PhysRevB.24.3354 ↗
6. M. Wittmer: Phys. Rev. B43, 4385 (1991)10.1103/PhysRevB.43.4385 ↗
7. C. Canali, C. Catellani, M. Prudenziati, W. H. Wadlin, C. A. Evans, Jr.: Appl. Phys. Lett.31, 43 (1977)10.1063/1.89473 ↗
8. G. Ottaviani: J. Vac. Sci. Technol.16, 1112 (1979)10.1116/1.570170 ↗
9. C. A. Crider, J. M. Poate: Appl. Phys. Lett.36, 4I7 (1980)10.1063/1.91522 ↗
10. C.-A. Chang: J. Appl. Phys.58, 1412 (1985)10.1063/1.336093 ↗
11. C. Harder, A. Emsermann, L. Hammer, K. Müller: Czech. J. Phys.44, 239 (1994)10.1007/BF01694487 ↗
12. N. J. Taylor, J. S. Johannessen, W. E. Spicer: Appl. Phys. Lett.29, 497 (1976)10.1063/1.89136 ↗
13. G. Todd, H. Poppa: J. Vac. Sci. Technol.15, 672 (1978)10.1116/1.569669 ↗
14. N. E. Elliott, W. E. Anderson, T. A. Archuleta, D. M. Stupin: J. Vac. Sci. Technol.20, 1372 (1982)10.1116/1.571609 ↗
15. C. Harder, L. Hammer, K. Müller: Phys. Stat. Sol. (a)146, 385 (1994)10.1002/pssa.2211460132 ↗
16. R. Matz, R. J. Purtell, Y. Yokota, G. W. Rubloff, P. S. Ho: J. Vac. Sci. Technol. A2, 253 (1984)10.1116/1.572574 ↗
17. H. S. Wildman, R. F. Bartholomew, W. A. Pliskin, M. Revitz: J. Vac. Sci. Technol.18, 955 (1981)10.1116/1.570963 ↗
18. G. Rossi, I. Abbati, L. Braicovitch, I. Lindau, W. E. Spicer: Phys. Rev. B25, 3627 (1982)10.1103/PhysRevB.25.3627 ↗
19. J. R. Abelson, K. B. Kim, D. E. Mercer, C. R. Helms, R. Sinclair, T. W. Sigmon: J. Appl. Phys.63, 689 (1988)10.1063/1.340058 ↗
20. S. J. Morgan, R. H. Williams, J. M. Mooney: Appl. Surf. Sci.56–58, 493 (1992)10.1016/0169-4332(92)90277-5 ↗
21. G. Betz, G. K. Wehner: InSputtering by Particle Bombardment II, ed by R. Behrisch, K. Wittmaak, Topics Appl. Phys, Vol. 52, 2nd edn. (Springer, Berlin, Heidelberg 1995) p. 32
22. P. M. Hall, J. M. Morabito: Surf. Sci.59, 624 (1976)10.1016/0039-6028(76)90041-8 ↗
23. L. R. Velho, R. W. Bartlett: Metall. Trans.3, 65 (1972)10.1007/BF02680586 ↗
24. H. Mehrer (ed.):Landolt-Börnstein, New Series III/26 (Springer, Berlin, Heidelberg 1990) p. 630
25. J. R. Manning:Diffusion Kinetics for Atoms in Crystals (van Nostrand, Princeton, NJ 1968) p. 9
26. T. Heumann:Diffusion in Metallen (Springer, Berlin, Heidelberg 1992) pp. 23810.1007/978-3-642-86413-1_9 ↗
27. K. Sreenivas, I. Reaney, T. Maeder, N. Setter, C. Jagadish, R. G. Elliman: J. Appl. Phys.75, 232 (1994)10.1063/1.355889 ↗
28. See Ref. [19] Sect. 2.3 and 2.4
29. S. M. Goodnick, M. Fathipour, D. L. Ellsworth, C. W. Wilmsen: J. Vac. Sci. Technol.18, 949 (1981)10.1116/1.570962 ↗
30. F. Nava, S. Valeri, G. Majni, A. Cembali, G. Pignatel, G. Queirolo: J. Appl. Phys.52, 6641 (1981)10.1063/1.328655 ↗
31. S. Valeri, U. del Pennino, P. Lomellini, G. Ottaviani: Surf. Sci.161, 1 (1985)10.1016/0039-6028(85)90723-X ↗
32. A. Winkler, X. Guo, H. R. Siddiqui, P. L. Hagans, J. T. Yates, Jr.: Surf. Sci.201, 419 (1988)10.1016/0039-6028(88)90495-5 ↗
33. C. A. Crider, J. M. Poate, J. E. Rowe, T. T. Sheng: J. Appl. Phys.52, 2860 (1981)10.1063/1.329018 ↗
34. C. A. Dimitriadis, E. K. Polychroniadis, E. K. Evangelou, G. E. Giakoumakis: J. Appl. Phys.70, 3109 (1991)10.1063/1.349289 ↗