journal article·1993-10

Determination of the copper diffusion coefficient in silicon from transient ion-drift

T. Heiser, A. Mesli

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Silicon and Solar Cell Technologies · Integrated Circuits and Semiconductor Failure Analysis · Semiconductor materials and interfaces

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References (14)

Show source-provided references
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5. A. Mesli, T. Heiser, E. Mulheim: to be published
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10. Unpublished results
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