journal article·2004-08

Femtosecond laser micromachining of grooves in indium phosphide

A. Borowiec, H.K. Haugen

Applied Physics A· Volume 79· Issue 3
Publisher page

Abstract

Femtosecond laser micromachining of indium phosphide is investigated using 150 fs light pulses at a center wavelength of 800 nm. The ablation rate for micromachining of grooves is investigated as a function of pulse energy, feed rate, number of passes over the same groove, and the light polarization relative to the cutting direction. A logarithmic dependence of the groove depth on the laser fluence is observed with two regimes characterized by different ablation rates and different thresholds. The groove depth is found to be inversely proportional to the feed rate or equivalently linearly proportional to number of pulses delivered per unit area. With multiple passes over the same groove the depth increases linearly up to about 20 consecutive passes. Above 20 passes the ablation rate decreases until a depth limit is approached. The best results in terms of groove geometry and depth limit are obtained with the polarization of the beam perpendicular to the cutting direction.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Laser Material Processing Techniques · Ocular and Laser Science Research · Advanced Optical Sensing Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (51)

Show source-provided references
1. See, e.g., A. Gat, J.F. Gibbons: Appl. Phys. Lett. 32, 142 (1978); R.T. Young, C.W. White, G.J. Clark, J. Narayan, W.H. Christie, M. Murakami, P.W. King, S.D. Kramer: Appl. Phys. Lett. 32, 139 (1978)10.1063/1.89960 ↗
2. P.L. Liu, R. Yen, N. Bloembergen, R.T. Hodgson: Appl. Phys. Lett. 34, 864 (1979)10.1063/1.90703 ↗
3. J.M. Liu, R. Yen, H. Kurz, N. Bloembergen: Appl. Phys. Lett. 39, 755 (1981)10.1063/1.92843 ↗
4. C.V. Shank, R. Yen, C. Hirlimann: Phys. Rev. Lett. 51, 900 (1983)10.1103/PhysRevLett.51.900 ↗
5. B.N. Chichkov, C. Momma, S. Nolte, F. von Alvensleben, A. Tünnermann: Appl. Phys. A 63, 109 (1996)10.1007/BF01567637 ↗
6. X. Liu, D. Du, G. Mourou: IEEE J. Quantum Electron. QE-33, 1706 (1997)10.1109/3.631270 ↗
7. L. Shah, J. Tawney, M. Richardson, K. Richardson: Appl. Surf. Sci. 183, 151 (2001)10.1016/S0169-4332(01)00468-8 ↗
8. D. Ramanathan, P.A. Molian: J. Manufacturing Sci. Eng. 124, 389 (2002)10.1115/1.1459083 ↗
9. G. Dumitru, V. Romano, H.P. Weber, M. Sentis, W. Marine: Appl. Phys. A 74, 729 (2002)10.1007/s003390101183 ↗
10. D. Ashkenasi, G. Müller, A. Rosenfeld, R. Stoian, I.V. Hertel, N.M. Bulgakova, E.E.B. Campbell: Appl. Phys. A 77, 223 (2003)10.1007/s00339-003-2143-3 ↗
11. S. Adachi: Properties of InP, INSPEC p. 416 (1993)
12. J. Bonse, J.M. Wrobel, J. Krüger, W. Kautek: Appl. Phys. A 72, 89 (2001)10.1007/s003390000596 ↗
13. M. Argument, S. Kirkwood, K. Chau, A. van Popta, Y. Tsui, R. Fedosejevs: SPIE 9–10, 196 (2002)
14. J.M. Liu: Opt. Lett. 7, 196 (1982)10.1364/OL.7.000196 ↗
15. D. von der Linde, K. Sokolowski-Tinten: Appl. Surf. Sci. 154–155, 1 (2000)10.1016/S0169-4332(99)00440-7 ↗
16. A. Borowiec, M. Mackenzie, G.C. Weatherly, H.K. Haugen: Appl. Phys. A 77, 411 (2003)10.1007/s00339-002-1949-8 ↗
17. Y. Jee, M.F. Becker, R.M. Walser: J. Opt. Soc. Am. B 5, 648 (1988)10.1364/JOSAB.5.000648 ↗
18. J. Güdde, J. Hohlfeld, J.G. Müller, E. Matthias: Appl. Surf. Sci. 127–129, 40 (1998)10.1016/S0169-4332(98)00002-6 ↗
19. D. Ashkenasi, M. Lorenz, R. Stoian, A. Rosenfeld: Appl. Surf. Sci. 150, 101 (1999)10.1016/S0169-4332(99)00228-7 ↗
20. J. Bonse, P. Rudolph, J. Krüger, S. Baudach, W. Kautek: Appl. Surf. Sci. 154–155, 659 (2000)10.1016/S0169-4332(99)00481-X ↗
21. J. Bonse, S. Baudach, J. Krüger, W. Kautek, M. Lenzner: Appl. Phys. A 74, 19 (2002)10.1007/s003390100893 ↗
22. D. Bäuerle: Laser Processing and Chemistry, (Springer-Verlag, Berlin Heidelberg 2000)10.1007/978-3-662-04074-4 ↗
23. S. Nolte, C. Momma, H. Jacobs, A. Tünnermann, B.N. Chichkov, B. Wellegehausen, H. Welling: J. Opt. Soc. Am. B 14, 2716 (1997)10.1364/JOSAB.14.002716 ↗
24. S. Preuss, A. Demchuk, M. Stuke: Appl. Phys. A 61, 33 (1995)10.1007/BF01538207 ↗
25. E.D. Pilak: Handbook of Optical Constants of Solids, (Academic Press, San Diego, California 1985)
26. W. Kautek, J. Krüger: Mater. Sci. Forum 173–174, 17 (1995)10.4028/www.scientific.net/MSF.173-174.17 ↗
27. L. Huang, J.P. Callan, E.N. Glezer, E. Mazur: Phys. Rev. Lett. 80, 185 (1998)10.1103/PhysRevLett.80.185 ↗
28. J. Bonse, J.M. Wrobel, K.W. Brzezinka, N. Esser, W. Kautek: Appl. Surf. Sci 202, 272 (2002)10.1016/S0169-4332(02)00948-0 ↗
29. K. Furusawa, K. Takahashi, H. Kumagai, K. Midorikawa, M. Obara: Appl. Phys. A. 69, S359 (1999)10.1007/s003390051417 ↗
30. K. Venkatakrishnan, B. Tan, B.K.A. Ngoi: Opt. Laser Technol. 34, 199 (2002)10.1016/S0030-3992(01)00110-4 ↗
31. Y. Hirayama, H. Yabe, M. Obara: J. Appl. Phys 89, 2943 (2001)10.1063/1.1342805 ↗
32. Y. Hirayama, M. Obara: J. Appl. Phys 90, 6447 (2001)10.1063/1.1415066 ↗
33. D. Ashkenasi, A. Rosenfeld, H. Varel, M. Wähmer, E.E.B. Campbell: Appl. Surf. Sci. 120, 65 (1997)10.1016/S0169-4332(97)00218-3 ↗
34. M. Lenzner, J. Krüger, S. Sartania, Z. Cheng, C. Spielmann, G. Mourou, W. Kautek, F. Krausz: Phys. Rev. Lett. 80, 4076 (1998)10.1103/PhysRevLett.80.4076 ↗
35. S. Ameer-Beg, W. Perrie, S. Rathbone, J. Wright, W. Weaver, H. Champoux: Appl. Surf. Sci. 127–129, 875 (1998)10.1016/S0169-4332(97)00760-5 ↗
36. E.E.B. Campbell, D. Ashkenasi, A. Rosenfeld: Lasers in Materials Science 301, 123 (1999), R.P. Agrawala ed. (Trans Tech. Publications Ltd. Switzerland, 1999)
37. A.E. Wynne, B.C. Stuart: Appl. Phys. A 76, 373 (2003)10.1007/s00339-002-1823-8 ↗
38. K. Venkatakrishnan, B. Tan, P. Stanley, L.E.N. Lim, B.K.A. Ngoi: Opt. Eng. 41(6), 1441 (2002)10.1117/1.1476324 ↗
39. W.M. Steen: Laser Material Processing (Springer-Verlag, London 1998)10.1007/978-1-4471-3609-5 ↗
40. N. Bärsch, K. Körber, A. Ostendorf, K.H. Tönshoff: Appl. Phys. A 77, 237 (2003)10.1007/s00339-003-2118-4 ↗
41. S. Nolte, C. Momma, G. Kamlage, A. Ostendorf, C. Fallnich, F. von Alvensleben, H. Welling: Appl. Phys. A 68, 563 (1999)10.1007/s003390050941 ↗
42. K. Venkatakrishnan, B. Tan, P. Stanley, N.R. Sivakumar: J. Appl. Phys. 92, 1604 (2002)10.1063/1.1487453 ↗
43. J. Bonse, M. Geuss, S. Baudach, H. Sturm, W. Kautek: Appl. Phys. A. 69, S399 (1999)10.1007/s003390051425 ↗
44. M. Prasad, H.E. Ruda, J.J. Dubowski: J. Vac. Sci. Technol. B 15, 2046 (1997)10.1116/1.589221 ↗
45. J.M. Wrobel, C.E. Moffitt, D.M. Wieliczka, J.J. Dubowski, J.W. Fraser: Appl. Surf. Sci. 127–129, 805 (1998)10.1016/S0169-4332(97)00746-0 ↗
46. R. Matz, H. Weber, G. Weimann: Appl. Phys. A 65, 349 (1997)10.1007/s003390050590 ↗
47. T.H. Her, R.J. Finlay, C. Wu, S. Deliwala, E. Mazur: Appl. Phys. Lett. 73, 1673 (1998)10.1063/1.122241 ↗
48. T.H. Her, R.J. Finlay, C. Wu, E. Mazur: Appl. Phys. A. 70, 383 (2000)10.1007/s003390051052 ↗
49. E. Dupont, X. Zhu, S. Chiu, S. Moisa, M. Buchanan, M. Gao, H.C. Liu, P.B. Corkum: Semicond. Sci. Technol. 15, L15 (2000)10.1088/0268-1242/15/3/102 ↗
50. T. Kim, H.S. Kim, M. Hetterich, D. Jones, J.M. Girkin, E. Bente, M.D. Dawson: Mater. Sci. Eng. B82, 262 (2001)10.1016/S0921-5107(00)00790-X ↗
51. Note that in our first preliminary work we reported that the data for groove depth versus pulse energy could be fit to a straight line over a substantial fluence range. See: A. Borowiec, H.K. Haugen, CLEO/QELS 2002 Technical Digest, paper CTuK37, p. 220, Long Beach, USA, 2002. However with much improved statistics and by including data for low pulse energies, it was found that the results were much better described by the approach outlined in this paper.