157-nm laser micromachining of N-BK7 glass and replication for microcontact printing
Source abstract
Abstract
We report etch-rate and probe-beam-deflection studies of N-BK7 glass ablated using a 157-nm F2 laser. It is found that controllable material removal at the nanometre level is possible above an ablation threshold of 250 mJ cm-2. Contact mask printing shows well-defined features can be micromachined in this glass with sub-micron resolution capability. Micro-features produced in this way have been replicated by polydimethylsiloxane (PDMS) moulding and the stamps used to print arrays of fluorescent molecules with sub-micron fidelity.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Laser Material Processing Techniques · Nonlinear Optical Materials Studies
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References (9)
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