Smart beam shaping for the deposition of solid polymeric material by laser forward transfer
Source abstract
Abstract
Laser-induced forward transfer (LIFT) has been investigated for the transfer of a polymeric material. This study focuses on the comparison of the printing process using conventional LIFT printing with a simple square mask and an optimized LIFT technique using a double mask setup, i.e. smart beam shaping (SBS). The purpose is to optimize the energy repartition on the donor layer using a beam profile with over-intensities at the edges and low intensities in the center. This allows the incoming irradiation fluence on the donor layer to be kept as low as possible in the central area, thus preventing the organic pixels being damaged by laser irradiation. The influence of the film's thickness on the SBS efficiency is discussed.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Laser Material Processing Techniques · Nanofabrication and Lithography Techniques · Nonlinear Optical Materials Studies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (27)
Show source-provided references
1. J. Bohandy, B.F. Kim, F.J. Adrian, J. Appl. Phys. 60, 1538–1539 (1986)10.1063/1.337287 ↗
2. A. Doraiswamy, R. Narayan, T. Lippert, L. Urech, A. Wokaun, M. Nagel, B. Hopp, M. Dinescu, R. Modi, R. Auyeung, D. Chrisey, Appl. Surf. Sci. 252, 4743–4747 (2006)10.1016/j.apsusc.2005.07.166 ↗
3. M. Duocastella, J. Fernández-Pradas, J. Domínguez, P. Serra, J. Morenza, Appl. Phys. A Mater. Sci. Process. 93, 941–945 (2008)10.1007/s00339-008-4741-6 ↗
4. J. Xu, J. Liu, D. Cui, M. Gerhold, A.Y. Wang, M. Nagel, T.K. Lippert, Nanotechnology 18, 025403 (2007)10.1088/0957-4484/18/2/025403 ↗
5. R. Fardel, M. Nagel, F. Nüesch, T. Lippert, A. Wokaun, Appl. Phys. Lett. 91, 061103 (2007)10.1063/1.2759475 ↗
6. L. Rapp, A.K. Diallo, A.-P. Alloncle, C. Videlot-Ackermann, F. Fages, P. Delaporte, Appl. Phys. Lett. 95, 171109 (2009)10.1063/1.3255011 ↗
7. D.P. Banks, K. Kaur, R. Gazia, R. Fardel, M. Nagel, T. Lippert, R.W. Eason, Europhys. Lett. 83, 38003 (2008)10.1209/0295-5075/83/38003 ↗
8. J. Wang, R.C.Y. Auyeung, H. Kim, N.A. Charipar, A. Piqué, Adv. Mater. 22, 4462–4466 (2010)10.1002/adma.201001729 ↗
9. A. Palla-Papavlu, V. Dinca, I. Paraico, A. Moldovan, J. Shaw-Stewart, C.W. Schneider, E. Kovacs, T. Lippert, M. Dinescu, J. Appl. Phys. 108, 033111 (2010)10.1063/1.3466746 ↗
10. V. Dinca, A. Palla-Papavlu, M. Dinescu, J. Shaw-Stewart, T. Lippert, F. Di Pietrantonio, D. Cannata, M. Benetti, E. Verona, Appl. Phys. A Mater. Sci. Process. 101, 559–565 (2010)10.1007/s00339-010-5898-3 ↗
11. C. Constantinescu, E. Morintale, V. Ion, A. Moldovan, C. Luculescu, M. Dinescu, P. Rotaru, Thin Solid Films 520, 3904–3909 (2012)10.1016/j.tsf.2012.01.039 ↗
12. A. Palla-Papavlu, I. Paraico, J. Shaw-Stewart, V. Dinca, T. Savopol, E. Kovacs, T. Lippert, A. Wokaun, M. Dinescu, Appl. Phys. A Mater. Sci. Process. 102, 651–659 (2011)10.1007/s00339-010-6114-1 ↗
13. J. Shaw-Stewart, T. Mattle, T. Lippert, M. Nagel, F. Nüesch, A. Wokaun, Appl. Surf. Sci. 278, 341–346 (2013)10.1016/j.apsusc.2012.11.076 ↗
14. J. Shaw-Stewart, T. Lippert, M. Nagel, F. Nüesch, A. Wokaun, ACS Appl. Mater. Interfaces 3(2), 309–316 (2011)10.1021/am100943f ↗
15. J. Shaw-Stewart, B. Chu, T. Lippert, Y. Maniglio, M. Nagel, F. Nüesch, A. Wokaun, Appl. Phys. A Mater. Sci. Process. 105, 713–722 (2011)10.1007/s00339-011-6583-x ↗
16. L. Rapp, C. Cibert, A.P. Alloncle, P. Delaporte, Appl. Surf. Sci. 255, 5439–5443 (2009)10.1016/j.apsusc.2008.07.165 ↗
17. R. Fardel, M. Nagel, F. Nüesch, T. Lippert, A. Wokaun, J. Phys. Chem. C 114, 5617–5636 (2010)10.1021/jp907387q ↗
18. J. Shaw-Stewart, T. Lippert, M. Nagel, F. Nüesch, A. Wokaun, Appl. Surf. Sci. 258, 9309–9313 (2012)10.1016/j.apsusc.2011.08.111 ↗
19. L. Rapp, C. Cibert, S. Nénon, A.P. Alloncle, M. Nagel, T. Lippert, C. Videlot-Ackermann, F. Fages, P. Delaporte, Appl. Surf. Sci. 257, 5245–5249 (2011)10.1016/j.apsusc.2010.10.147 ↗
20. D. Bellus, Adv. Photochem. 8, 109–159 (1971)10.1002/9780470133385.ch3 ↗
21. J. March, Advanced organic chemistry: reactions, mechanisms, and structure, 3rd edn. (Wiley, New York, 1985), ISBN 0-471-85472-7
22. R.C.Y. Auyeung, H. Kim, N.A. Charipar, A.J. Birnbaum, S.A. Mathews, A. Piqué, Appl. Phys. A Mater. Sci. Process. 102, 21–26 (2011)10.1007/s00339-010-6054-9 ↗
23. B. Mills, M. Feinaeugle, C.L. Sones, N. Rizvi, R.W. Eason, J. Micromech. Microeng. 23, 035005 (2013)10.1088/0960-1317/23/3/035005 ↗
24. B. Mills, J.A. Grant-Jacob, M. Feinaeugle, R.W. Eason, Opt. Express 21, 14853 (2013)10.1364/OE.21.014853 ↗
25. M. Feinaeugle, C.L. Sones, E. Koukharenko, B. Gholipour, D.W. Hewak, R.W. Eason, Appl. Phys. A Mater. Sci. Process. 112, 1073–1079 (2013)10.1007/s00339-012-7491-4 ↗
26. R. Fardel, M. Nagel, F. Nuesch, T. Lippert, A. Wokaun, Appl. Surf. Sci. 254, 1322–1326 (2007)10.1016/j.apsusc.2007.08.091 ↗
27. R. Fardel, M. Nagel, T. Lippert, F. Nuesch, A. Wokaun, B.S. Luk’yanchuk, Appl. Phys. A Mater. Sci. Process. 90, 661–667 (2008)10.1007/s00339-007-4334-9 ↗