journal article·2017-02-01Open access

Fabrication of bit patterned media using templated two-phase growth

Vignesh Sundar, XiaoMin Yang, Yang Liu, Zhengkun Dai, Bing Zhou, Jingxi Zhu, Kim Lee, Thomas Chang, David Laughlin, Jian-Gang (Jimmy) Zhu

APL Materials· Volume 5· Issue 2

Abstract

In fabricating high areal density magnetic nanostructures for bit patterned magnetic recording media, conventional lithography methods are limited in scaling and often present other challenges, for instance, as etch-damage in case of subtractive schemes. In this paper, we present a novel two-phase growth scheme that enables the fabrication of nanostructures of one material embedded in a matrix of a different material by choosing a separation material that is immiscible with the material of the nanostructure and by designing a template whose material and morphology guides the separation of the two phases and their subsequent growth.
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Research context

OpenAlex topics: Block Copolymer Self-Assembly · Fluid Dynamics and Thin Films · Anodic Oxide Films and Nanostructures

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Affiliations

Carnegie Mellon University 1 Department of Electrical and Computer Engineering, , Pittsburgh, Pennsylvania 15213, USA

Seagate Technology 2 , Fremont, California 94538, USA

Carnegie Mellon University 3 Department of Materials Science and Engineering, , Pittsburgh, Pennsylvania 15213, USA

Sun Yat-sen University-Carnegie Mellon University Joint Institute of Engineering 4 , Guangzhou, China

Sun Yat-sen University-Carnegie Mellon University Shunde International Joint Research Institute 5 , Guangdong, China

Funding

Data Storage Systems Center, Carnegie Mellon University

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