journal article·2025-06-01Open access

In situ synchrotron x-ray studies of epitaxial SrCoOx films during ionic liquid gating

Yan Li, Jill K. Wenderott, Tadesse Billo, Maoyu Wang, Alvin Chang, Hui Cao, Xi Yan, D. Bruce Buchholz, Zhenxing Feng, Hua Zhou, Supratik Guha, Dillon D. Fong

APL Materials· Volume 13· Issue 6

Abstract

The manipulation of ions in complex oxide materials can be used to mimic brain-like plasticity through changes to the resistivity of a neuromorphic device. Advances in the design of more energy efficient devices require improved understanding of how ions migrate within a material and across its interface. We investigate the exchange of oxygen and hydrogen in a model SrCoOx epitaxial film—a material that transitions between a ferromagnetic metal and antiferromagnetic insulator depending on the oxygen concentration. Changes to the film during ionic liquid gating were measured by in situ synchrotron x-ray techniques as a function of time and gate voltage, examining the reversibility of the oxide over one complete gating cycle. We find that the out-of-plane lattice constant and oxygen vacancy concentration of SrCoOx are largely reversible although changes were observed in the ordered vacancy structure. Our results provide much needed insight into electrolyte-gated phase behavior in the transition metal oxides.
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Research context

OpenAlex topics: Electronic and Structural Properties of Oxides · Semiconductor materials and devices · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Materials Science Division, Argonne National Laboratory 1 , Lemont, Illinois 60439,

X-ray Science Division, Advanced Photon Source, Argonne National Laboratory 2 , Lemont, Illinois 60439,

School of Chemical, Biological and Environmental Engineering, Oregon State University 3 , Corvallis, Oregon 97331,

Department of Materials Science and Engineering, Northwestern University 4 , Evanston, Illinois 60201,

Pritzker School of Molecular Engineering, University of Chicago 5 , Chicago, Illinois 60637,

Funding

U.S. Department of Energy

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