journal article·2018-06-01Open access

A new stable, crystalline capping material for topological insulators

H. Y. Lin, C. K. Cheng, K. H. M. Chen, C. C. Tseng, S. W. Huang, M. T. Chang, S. C. Tseng, M. Hong, J. Kwo

APL Materials· Volume 6· Issue 6

Abstract

To preserve the high quality topological surface state after air exposure without degradation, it is crucial to identify an effective capping layer. In this study, we report an effective capping layer obtained by crystallizing Se. Upon extended exposure to ultrahigh vacuum or humid air, we show by using x-ray photoemission spectroscopy that the stability and resistance to oxidation of crystalline Se capping layers are superior to those of the amorphous Se capping layer, which has been commonly used by current communities. Furthermore, time-dependent Hall measurements showed that crystalline Se capping layers had a much stronger ability to sustain the intrinsic transport properties of Bi2Se3.
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Research context

OpenAlex topics: Topological Materials and Phenomena · Graphene research and applications · 2D Materials and Applications

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Affiliations

Department of Physics, National Tsing Hua University 1 , Hsinchu 30013, Taiwan

Department of Physics and Graduate Institute of Applied Physics, National Taiwan University 2 , Taipei 10617, Taiwan

Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan 3 , Taoyuan 32546, Taiwan

National Synchrotron Radiation Research Center 4 , Hsinchu 30076, Taiwan

Funding

Ministry of Science and Technology, Taiwan

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