DataVXAPL MaterialsPaper
journal article·2015-10Open access

Examination of interfacial charge transfer in photocatalysis using patterned CuO thin film deposited on TiO2

K. Osako, K. Matsuzaki, H. Hosono, G. Yin, D. Atarashi, E. Sakai, T. Susaki, M. Miyauchi

APL Materials· Volume 3· Issue 10
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Source abstract

Abstract

We examined the interfacial charge transfer effect on photocatalysts using a patterned CuO thin film deposited on a rutile TiO2 (110) substrate. Photocatalytic activity was visualized based on the formation of metal Ag particles resulting from the photoreduction of Ag+ ions under visible-light illumination. Ag particles were selectively deposited near the edge of CuO film for several nanometer thick CuO film, indicating that interfacial excitation from the valence band maximum of TiO2 to the conduction band minimum of CuO plays a key role in efficient photocatalytic activity of CuO nanocluster-grafted TiO2 systems with visible-light sensitivity.
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Research context

NanomaterialsCatalysis & surfaces

OpenAlex topics: Copper-based nanomaterials and applications · ZnO doping and properties · Advanced Photocatalysis Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo, Japan

Secure Materials Center, Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Japan

Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Japan

PRESTO, Japan Science and Technology Agency (JST), 4-1-8, Honcho, Kawaguchi-shi, Saitama, Japan

Funding

Ministry of Education, Culture, Sports, Science, and Technology (MEXT) · Japan Science and Technology Agency (JST)

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