journal article·2019-01-01Open access

Titanium-based thin film metallic glass as diffusion barrier layer for PbTe-based thermoelectric modules

Chia-Chi Yu, Hsin-jay Wu, Matthias T. Agne, Ian T. Witting, Ping-Yuan Deng, G. Jeffrey Snyder, Jinn P. Chu

APL Materials· Volume 7· Issue 1

Abstract

The thin film metallic glass (TFMG) is an effective diffusion barrier layer for PbTe-based thermoelectric (TE) modules. Reaction couples structured with Cu/TFMG/PbTe are prepared via sputter-deposition and are annealed at 673 K for 8-96 h. The transmission line method is adopted for the assessment of electrical contact resistivity upon the PbTe/TFMG, and the value remains in the range of 3.3-2.5 × 10−9 (Ω m2). The titanium-based TFMG remains amorphous upon annealing at 673 K for 48 h and effectively blocks the inter-diffusion by not having grain-boundaries, which only allows the bulk diffusion between the metal electrode and the TE substrate.
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Research context

OpenAlex topics: Advanced Thermoelectric Materials and Devices · Thermal properties of materials · Thermal Radiation and Cooling Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science and Engineering, National Taiwan University of Science and Technology 1 , Taipei 10607, Taiwan

Department of Materials and Optoelectronic Science, National Sun Yat-sen University 2 , Kaohsiung 80424, Taiwan

Department of Materials Science and Engineering, National Chiao Tung University 3 , Hsinchu 30010, Taiwan

Department of Materials Science and Engineering, Northwestern University 4 , Evanston, Illinois 60208, USA

Applied Research Center for Thin-Film Metallic Glass, National Taiwan University of Science and Technology 5 , Taipei 10607, Taiwan

Funding

Ministry of Science and Technology, Taiwan

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