Epitaxial growth of high quality WO3 thin films
Source abstract
Abstract
We have grown epitaxial WO3 films on various single-crystal substrates using radio frequency magnetron sputtering. While pronounced surface roughness is observed in films grown on LaSrAlO4 substrates, films grown on Y AlO3 substrates show atomically flat surfaces, as demonstrated by atomic force microscopy and X-ray diffraction (XRD) measurements. The crystalline structure has been confirmed to be monoclinic by symmetric and skew-symmetric XRD. The dependence of the growth modes and the surface morphology on the lattice mismatch are discussed.
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Research context
OpenAlex topics: Transition Metal Oxide Nanomaterials · Gas Sensing Nanomaterials and Sensors · ZnO doping and properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Brookhaven National Laboratory 1 , Upton, New York 11973, USA
Jožef Stefan Institute 2 , Jamova 39, 1000 Ljubljana, Slovenia
Yale University 3 Applied Physics Department, , New Haven, Connecticut 06520, USA
Funding
US Department of Energy
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