journal article·2014-03-01Open access

Electrochemical deposition of iron sulfide thin films and heterojunction diodes with zinc oxide

Shoichi Kawai, Ryuta Yamazaki, Susumu Sobue, Eiichi Okuno, Masaya Ichimura

APL Materials· Volume 2· Issue 3

Abstract

Iron sulfide thin films were fabricated by the electrochemical deposition method from an aqueous solution containing FeSO4 and Na2S2O3. The composition ratio obtained was Fe:S:O = 36:56:8. In the photoelectrochemical measurement, a weak negative photo-current was observed for the iron sulfide films, which indicates that its conduction type is p-type. No peaks were observed in X-ray diffraction pattern, and thus the deposited films were considered to be amorphous. For a heterojunction with ZnO, rectification properties were confirmed in the current-voltage characteristics. Moreover, the current was clearly enhanced under AM1.5 illumination.
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Research context

OpenAlex topics: Metal Extraction and Bioleaching · Chalcogenide Semiconductor Thin Films · Corrosion Behavior and Inhibition

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

DENSO CORP. Research Laboratories 1 , Komenoki, Nissin, Aichi 470-0111, Japan

Nagoya Institute of Technology 2 Department of Engineering Physics, Electronics and Mechanics, , Nagoya 466-8555, Japan

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