journal article·2017-04-01Open access

Research Update: Diode performance of the Pt/Al2O3/two-dimensional electron gas/SrTiO3 structure and its time-dependent resistance evolution

Taehwan Moon, Hae Jun Jung, Yu Jin Kim, Min Hyuk Park, Han Joon Kim, Keum Do Kim, Young Hwan Lee, Seung Dam Hyun, Hyeon Woo Park, Sang Woon Lee, Cheol Seong Hwang

APL Materials· Volume 5· Issue 4

Abstract

Time domain electric pulse measurements were conducted on a capacitor consisting of a Pt film as the top electrode, atomic-layer-deposited 6.5-nm-thick amorphous Al2O3 as the dielectric layer, and two-dimensional electron gas (2DEG) at the interface between Al2O3 and SrTiO3 as the bottom electrode. The sample showed highly useful current-voltage characteristics as the selector in cross-bar array resistance switching random access memory. The long-term (order of second) variation in the leakage current when the Pt electrode was positively biased was attributed to the field-induced migration of oxygen vacancies between the interior of the Al2O3 and the 2DEG region. Relaxation of the vacancy concentration occurred even at room temperature.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Electronic and Structural Properties of Oxides · Semiconductor materials and devices · Ferroelectric and Piezoelectric Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Seoul National University 1 Department of Materials Science and Engineering, , Seoul 151-747, South Korea

Ajou University 2 Department of Physics and Division of Energy Systems Research, , Suwon, Gyeonggi 443-749, South Korea

Funding

National Research Foundation of Korea

References (24)

Show source-provided references
1. Nat. Mater. · 2007 · 6 · 49310.1038/nmat1931 ↗
2. Nat. Phys. · 2011 · 7 · 76210.1038/nphys2080 ↗
3. Phys. Rev. Lett. · 2011 · 107 · 05680210.1103/PhysRevLett.107.056802 ↗
4. Adv. Mater. · 2014 · 26 · 596210.1002/adma.201401597 ↗
5. J. Phys.: Condens. Matter · 2010 · 22 · 31550110.1088/0953-8984/22/31/315501 ↗
6. ACS Nano · 2012 · 6 · 127810.1021/nn203991q ↗
7. ACS Nano · 2013 · 7 · 867310.1021/nn40291848 ↗
8. ACS Appl. Mater. Interfaces · 2014 · 6 · 857510.1021/am501387w ↗
9. Phys. Rev. X · 2013 · 3 · 04102710.1103/PhysRevX.3.041027 ↗
10. Adv. Mater. Interfaces · 2014 · 1 · 130003110.1002/admi.201300031 ↗
11. Appl. Phys. Lett. · 2012 · 100 · 05350610.1063/1.3682102 ↗
12. Nano Lett. · 2012 · 12 · 477510.1021/nl302214x ↗
13. Nanoscale · 2013 · 5 · 894010.1039/c3nr03082b ↗
14. J. Vac. Sci. Technol., B · 2000 · 18 · 213910.1116/1.1303737 ↗
15. Adv. Funct. Mater. · 2014 · 34 · 531610.1002/adfm.201303520 ↗
16. Nanotechnology · 2010 · 21 · 38520210.1088/0957-4484/21/38/385202 ↗
17. Adv. Mater. · 2016 · 28 · 35610.1002/adma.201503604 ↗
18. Science · 1994 · 266 · 154010.1126/science.266.5190.1540 ↗
19. Sci. Rep. · 2015 · 5 · 802310.1038/srep08023 ↗
20. Thin Solid Films · 2002 · 413 · 18610.1016/S0040-6090(02)00438-8 ↗
21. Chem. Mater. · 2004 · 16 · 63910.1021/cm0304546 ↗
22. Appl. Phys. Lett. · 2010 · 96 · 03290510.1063/1.3293440 ↗
23. J. Controlled Release · 1987 · 5 · 2310.1016/0168-3659(87)90034-4 ↗
24. Nat. Mater.10.1038/NMAT4756 ↗