journal article·2018-12-01Open access

Perspective: Fundamentals of coalescence-related dislocations, applied to selective-area growth and other epitaxial films

William E. McMahon, Michelle Vaisman, Jeramy D. Zimmerman, Adele C. Tamboli, Emily L. Warren

APL Materials· Volume 6· Issue 12

Abstract

Although selective area growth (SAG) and coalesced SAG (cSAG) have been utilized extensively for many years to moderate the material quality of lattice-mismatched films, the geometrical factors controlling dislocations in coalesced films are difficult to visualize, and some confusion regarding the topology of dislocations for cSAG still persists. In this paper, we describe the topology of dislocations during island coalescence for cSAG, framed in terms of fundamental dislocation properties and virtual dislocations, which are used as a helpful visualization tool. We also show how the results and methods are generally applicable to coalescence of any other epitaxial film.
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Research context

OpenAlex topics: Semiconductor materials and devices · Copper Interconnects and Reliability · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

National Renewable Energy Laboratory 1 , Golden, Colorado 80401, USA

Department of Electrical Engineering, Yale University 2 , New Haven, Connecticut 06520, USA

Department of Physics, Colorado School of Mines 3 , Golden, Colorado 80401, USA

Funding

National Aeronautics and Space Administration · U.S. Department of Energy

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