journal article·2019-07-01Open access

Enhanced electro-mechanical coupling of TiN/Ce0.8Gd0.2O1.9 thin film electrostrictor

Simone Santucci, Haiwu Zhang, Simone Sanna, Nini Pryds, Vincenzo Esposito

APL Materials· Volume 7· Issue 7

Abstract

Gadolium doped ceria, Gd:CeO2 (CGO), have recently been shown to possess an exceptional high electrostriction coefficient (Q), which is at the least three orders of magnitude larger than the best performing lead-based electrostrictors, e.g. Pb(Mn1/3Nb2/3)O3. Herein, we show that CGO thin films fabricated by a pulsed laser deposition method can be directly integrated onto the Si substrate by using TiN films of few nanometers as functional electrodes. The exceptional good coupling between TiN and Ce0.8Gd0.2O1.9 yields a high electrostriction coefficient of Qe = 40 m4 C−2 and a superior electrochemomechanical stability with respect to the metal electrodes.
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Research context

OpenAlex topics: Ferroelectric and Piezoelectric Materials · Semiconductor materials and devices · Electronic and Structural Properties of Oxides

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Energy Conversion and Storage, Technical University of Denmark , Frederiksborgvej 399 Roskilde, Denmark

Funding

H2020 Future and Emerging Technologies

References (46)

Show source-provided references
1. Science · 2011 · 334 · 95810.1126/science.1207186 ↗
2. J. Am. Ceram. Soc. · 1999 · 82 · 79710.1111/j.1151-2916.1999.tb01840.x ↗
3. J. Appl. Phys. · 2001 · 89 · 806610.1063/1.1371002 ↗
4. Sens. Actuators, A · 2003 · 105 · 16210.1016/s0924-4247(03)00090-6 ↗
5. J. Electroceram. · 2004 · 12 · 1910.1023/B:JECR.0000033999.74149.a3 ↗
6. J. Appl. Phys. · 2017 · 122 · 11450210.1063/1.5000367 ↗
7. J. Micromech. Microeng. · 2010 · 20 · 05500810.1088/0960-1317/20/5/055008 ↗
8. ACS Appl. Mater. Interfaces · 2016 · 8 · 3112010.1021/acsami.6b09470 ↗
9. Adv. Mater. · 2012 · 24 · 585710.1002/adma.201202270 ↗
10. Sens. Actuators, A · 2013 · 201 · 7310.1016/j.sna.2013.06.021 ↗
11. KnE Mater. Sci. · 2016 · 1 · 17710.18502/kms.v1i1.582 ↗
12. Appl. Phys. Lett. · 2015 · 106 · 04290410.1063/1.4906857 ↗
13. Acta Mater. · 2019 · 174 · 5310.1016/j.actamat.2019.05.009 ↗
14. Energy Environ. Sci. · 2012 · 5 · 847510.1039/c2ee22310d ↗
15. Phys. Rev. B · 2013 · 87 · 05410110.1103/physrevb.87.054101 ↗
16. Mater. Res. Bull. · 1996 · 31 · 55510.1016/s0025-5408(96)00036-0 ↗
17. Appl. Phys. Rev. · 2014 · 1 · 01110310.1063/1.4861260 ↗
18. 2017 · 0
19. IOP Conf. Ser.: Mater. Sci. Eng. · 2016 · 146 · 01200610.1088/1757-899x/146/1/012006 ↗
20. Adv. Funct. Mater. · 2016 · 26 · 113810.1002/adfm.201503942 ↗
21. J. Phys. Chem. B · 1997 · 101 · 1014110.1021/jp971522c ↗
22. Scr. Mater. · 2011 · 65 · 11210.1016/j.scriptamat.2010.09.021 ↗
23. AIP Adv. · 2016 · 6 · 05532010.1063/1.4952645 ↗
24. Acta Mater. · 2016 · 118 · 110.1016/j.actamat.2016.07.025 ↗
25. Sens. Actuators, A · 2017 · 264 · 33310.1016/j.sna.2017.07.047 ↗
26. Appl. Phys. Lett. · 2017 · 110 · 14290210.1063/1.4979642 ↗
27. Acta Mater. · 2008 · 56 · 17710.1016/j.actamat.2007.09.006 ↗
28. Appl. Surf. Sci. · 2009 · 255 · 523210.1016/j.apsusc.2008.07.134 ↗
29. RSC Adv. · 2017 · 7 · 1378410.1039/c7ra01226h ↗
30. Thin Solid Films · 1985 · 128 · 2110.1016/0040-6090(85)90333-5 ↗
31. Thin Solid Films · 2015 · 578 · 3110.1016/j.tsf.2015.02.009 ↗
32. Eng. Fract. Mech. · 1998 · 61 · 14110.1016/s0013-7944(98)00052-6 ↗
33. Microelectron. Eng. · 2006 · 83 · 155110.1016/j.mee.2006.01.161 ↗
34. Thin Solid Films · 2010 · 518 · 438010.1016/j.tsf.2010.01.060 ↗
35. Electroanalysis · 2007 · 19 · 102310.1002/elan.200703832 ↗
36. J. Microelectromech. Syst. · 2010 · 19 · 22910.1109/jmems.2009.2039697 ↗
37. Solid State Ionics · 2012 · 211 · 1210.1016/j.ssi.2012.01.014 ↗
38. J. Electrochem. Soc. · 2002 · 149 · J7310.1149/1.1507597 ↗
39. Adv. Funct. Mater. · 2008 · 18 · 12710.1002/adfm.200700136 ↗
40. Appl. Surf. Sci. · 2009 · 255 · 519110.1016/j.apsusc.2008.10.101 ↗
41. Adv. Funct. Mater. · 2009 · 19 · 171310.1002/adfm.200801768 ↗
42. Appl. Phys. A · 2010 · 101 · 60110.1007/s00339-010-5975-7 ↗
43. J. Mater. Res. · 1996 · 11 · 145810.1557/jmr.1996.0182 ↗
44. Cryst. Growth Des. · 2017 · 17 · 663410.1021/acs.cgd.7b01278 ↗
45. J. Appl. Phys. · 1996 · 80 · 456610.1063/1.363439 ↗
46. J. Mech. Phys. Solids · 2018 · 112 · 110.1016/j.jmps.2017.11.009 ↗