Growth, structural and optical properties of coherent κ-(AlxGa1−x)2O3/κ-Ga2O3 quantum well superlattice heterostructures

High quality heteroepitaxial (001)-oriented κ-(AlxGa1−x)2O3/κ-Ga2O3 quantum well superlattice heterostructures were deposited by tin-assisted pulsed laser deposition on c-sapphire substrates. Sharp superlattice fringes up to the ninth order in XRD patterns for Al-contents up to about 50 at. % confirm excellent structural quality and smooth interfaces in the multilayers on par with reports on homoepitaxial superlattices in the monoclinic modification. By employing elliptically segmented targets, the Al-content in the barrier layers of the superlattices was systematically varied in a range of 0.1 ≤ x ≤ 0.5 in a controlled and quasi-continuous manner. An in-depth investigation employing XRD 2θ-ω scans and reciprocal space map measurements on superlattices with different periods as well as single quantum well samples suggests coherent growth of the superlattices for application-relevant quantum well widths. The critical thickness for coherent growth of κ-Ga2O3 on κ-(AlxGa1−x)2O3 was further estimated to be at least 50 nm and 3 nm for x = 0.2 and x = 0.3, respectively. We determined absorption energies in optical transmission spectra for superlattices with x = 0.3 well below the bandgap of the barrier layers that decrease with increasing quantum well width suggesting transitions between localized states in the quantum wells as their origin. These results render superlattices in the metastable orthorhombic phase of Ga2O3 as a promising active layer for quantum well infrared photodetector applications.