journal article·2022-06-01Open access

Thermodynamically metastable α-, ε- (or κ-), and γ-Ga2O3: From material growth to device applications

Mahitosh Biswas, Hiroyuki Nishinaka

APL Materials· Volume 10· Issue 6

Abstract

Gallium oxide (Ga2O3) has attracted tremendous attention in power electronics and ultraviolet photodetectors because of the large bandgap of 4.9–5.3 eV available to all polymorphs, as well as its high electric breakdown voltage. Recently, there has been increasing research interest in thermodynamically metastable phases such as α-, ε- (or κ-), and γ-Ga2O3, because they are predicted to exhibit superior properties compared with β-Ga2O3, the most stable phase of Ga2O3. For example, α-Ga2O3 (bandgap, Eg = 5.3 eV; expected breakdown field, Ec = ∼10 MV/cm) is expected to be a better potential candidate in power electronics than β-Ga2O3 (Eg = 4.5–4.8 eV; Ec = 8 MV/cm) because of its larger bandgap and higher breakdown field. Because these thermodynamically metastable phases cannot be grown using melt-growth techniques, they are grown heteroepitaxially on foreign substrates. We extensively illustrate the growth of these metastable phases and their alloys by employing various growth techniques and then discuss their doping and electronic properties. Finally, we emphasize their applications in devices, including power devices and solar-blind ultraviolet photodetectors.
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Research context

OpenAlex topics: Ga2O3 and related materials · ZnO doping and properties · Advanced Photocatalysis Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Faculty of Physics and Astronomy, Julius-Maximilians-Universität Würzburg 1 , Würzburg 97070, Germany

Faculty of Electrical Engineering and Electronics, Kyoto Institute of Technology 2 , Kyoto 606-8585, Japan

References (100+)

Show source-provided references
1. 2018
2. ECS J. Solid State Sci. Technol. · 2017 · 6 · Q306110.1149/2.0111702jss ↗
3. High critical electric field of AlxGa1−xN p-i-n vertical conducting diodes on n-SiC substrates10.1063/1.2198092 ↗
4. AlN/AlGaN HEMTs on AlN substrate for stable high-temperature operation10.1049/el.2013.2846 ↗
5. Recent development of boron nitride towards electronic applications10.1002/aelm.201600485 ↗
6. Maximum hole concentration for Hydrogen-terminated diamond surfaces with various surface orientations obtained by exposure to highly concentrated NO210.1016/j.diamond.2012.10.007 ↗
7. C-H surface diamond field effect transistors for high temperature (400 °C) and high voltage (500 V) operation10.1063/1.4884828 ↗
8. Diamond logic inverter with enhancement-mode metal-insulator-semiconductor field effect transistor10.1063/1.4894291 ↗
9. A review of Ga2O3 materials, processing, and devices10.1063/1.5006941 ↗
10. Field-plated Ga2O3 MOSFETs with a breakdown voltage of over 750 V10.1109/led.2015.2512279 ↗
11. Perspective—Opportunities and future directions for Ga2O310.1149/2.0031707jss ↗
12. Gallium oxide (Ga2O3) metal-semiconductor field-effect transistors on single-crystal β-Ga2O3 (010) substrates10.1063/1.3674287 ↗
13. β-Ga2O3 delta-doped field-effect transistors with current gain cutoff frequency of 27 GHz10.1109/led.2019.2920366 ↗
14. Normally-off β-Ga2O3 power MOSFET with ferroelectric charge storage gate stack structure10.1109/led.2020.2970066 ↗
15. Vertical solar-blind deep-ultraviolet Schottky photodetectors based on β-Ga2O3 substrates10.1143/apex.1.011202 ↗
16. Solar-blind ultraviolet photodetector based on vertically aligned single-crystalline β-Ga2O3 nanowire arrays10.1515/nanoph-2020-0295 ↗
17. Self-powered solar-blind α-Ga2O3 thin-film UV-C photodiode grown by halide vapor-phase epitaxy10.1063/5.0067133 ↗
18. B. Bayraktaroglu , “Assessment of gallium oxide technology,” Air Force Research Laboratory Report No. AFRL-RY-WP-TR-2017-0167, 2017.
19. Perspective: Ga2O3 for ultra-high power rectifiers and MOSFETS10.1063/1.5062841 ↗
20. Epitaxial β-Ga2O3 and β-(AlxGa1−x)2O3/β-Ga2O3 heterostructures growth for power electronics10.1109/tsm.2018.2873488 ↗
21. β-(AlxGa1−x)2O3/Ga2O3 (010) heterostructures grown on β-Ga2O3 (010) substrates by plasma-assisted molecular beam epitaxy10.1116/1.4922340 ↗
22. Band gap of corundumlike α-Ga2O3 determined by absorption and ellipsometry10.1103/physrevmaterials.1.024604 ↗
23. Evolution of corundum-structured III-oxide semiconductors: Growth, properties, and devices10.7567/jjap.55.1202a3 ↗
24. Reduction in edge dislocation density in corundum-structured α-Ga2O3 layers on sapphire substrates with quasi-graded α-(Al,Ga)2O3 buffer layers10.7567/apex.9.071101 ↗
25. Structures of uncharacterised polymorphs of gallium oxide from total neutron diffraction10.1002/chem.201203359 ↗
26. Recent progress on the electronic structure, defect, and doping properties of Ga2O310.1063/1.5142999 ↗
27. Bond lengths in the α-Ga2O3 structure and the high-pressure phase of Ga2−xFexO310.1063/1.1840945 ↗
28. Heteroepitaxy of corundum-structured α-Ga2O3 thin films on α-Al2O3 substrates by ultrasonic mist chemical vapor deposition10.1143/jjap.47.7311 ↗
29. Characterization of β-Ga2O3 and its alumina isomorph θ-Al2O3
30. Growth, structure and carrier transport properties of Ga2O3 epitaxial film examined for transparent field-effect transistor10.1016/j.tsf.2005.08.187 ↗
31. Heteroepitaxial growth of ε-Ga2O3 thin films on cubic (111) MgO and (111) yttria-stabilized zirconia substrates by mist chemical vapor deposition10.7567/jjap.55.1202bc ↗
32. The real structure of ϵ-Ga2O3 and its relation to κ-phase10.1039/c7ce00123a ↗
33. First-principle calculations of electronic structures and polar properties of (κ,ε)-Ga2O310.7567/apex.11.061101 ↗
34. Microstructural and thermodynamic study of γ-Ga2O310.3139/146.018018 ↗
35. Epitaxial growth of γ-Ga2O3 films by mist chemical vapor deposition10.1016/j.jcrysgro.2012.08.025 ↗
36. Epitaxial growth of phase-pure ε-Ga2O3 by halide vapor phase epitaxy10.1063/1.4929417 ↗
37. Crystal structure and ferroelectric properties of ε-Ga2O3 films grown on (0001)-sapphire10.1021/acs.inorgchem.6b02244 ↗
38. Microstructures and rotational domains in orthorhombic ε-Ga2O3 thin films10.7567/jjap.57.115601 ↗
39. Hexagonal phase-pure wide band gap ε-Ga2O3 films grown on 6H-SiC substrates by metal organic chemical vapor deposition10.1063/1.4950867 ↗
40. Growth of β-Ga2O3 single crystals by the edge-defined, film fed growth method10.1143/jjap.47.8506 ↗
41. On the bulk β-Ga2O3 single crystals grown by the Czochralski method10.1016/j.jcrysgro.2014.07.021 ↗
42. Czochralski grown Ga2O3 crystals10.1016/s0022-0248(00)00851-4 ↗
43. Large-size β-Ga2O3 single crystals and wafers10.1016/j.jcrysgro.2004.06.027 ↗
44. Growth of β-Ga2O3 single crystals using vertical Bridgman method in ambient air10.1016/j.jcrysgro.2016.04.022 ↗
45. Influence of incoherent twin boundaries on the electrical properties of β-Ga2O3 layers homoepitaxially grown by metal–organic vapor phase epitaxy10.1063/1.4993748 ↗
46. Ga2O3 polymorphs: Tailoring the epitaxial growth conditions10.1039/d0tc02743j ↗
47. Indium gallium oxide alloys: Electronic structure, optical gap, surface space charge, and chemical trends within common-cation semiconductors10.1021/acsami.0c16021 ↗
48. High-pressure study of the β-to-α transition in Ga2O310.1103/physrevb.73.094125 ↗
49. Growth characteristics of corundum-structured α-(AlxGa1−x)2O3/Ga2O3 heterostructures on sapphire substrates10.1016/j.jcrysgro.2015.12.013 ↗
50. Epitaxial lateral overgrowth of α-Ga2O3 by halide vapor phase epitaxy10.1063/1.5051058 ↗
51. Polymorphism of Ga2O3 and the system Ga2O3—H2O10.1021/ja01123a039 ↗
52. Phase diagram and polarization of stable phases of (Ga1−xInx)2O310.7567/apex.9.041102 ↗
53. IEEE Electron Devices Lett. · 2010 · 31 · 19210.1109/led.2009.2039024 ↗
54. ε-Ga2O3 epilayers as a material for solar-blind UV photodetectors10.1016/j.matchemphys.2017.11.023 ↗
55. Hetero-epitaxy of ε-Ga2O3 layers by MOCVD and ALD10.1016/j.jcrysgro.2016.03.013 ↗
56. Tin-assisted heteroepitaxial PLD-growth of κ-Ga2O3 thin films with high crystalline quality10.1063/1.5054378 ↗
57. Epitaxial growth of Mn-doped γ-Ga2O3 on spinel substrate10.1557/jmr.2010.32 ↗
58. Room temperature ferromagnetism in Mn-doped γ-Ga2O3 with spinel structure10.1063/1.2369541 ↗
59. Mist-CVD grown Sn-doped α-Ga2O3 MESFETs10.1109/ted.2015.2477438 ↗
60. Epitaxial growth of corundum-structured wide band gap III-oxide semiconductor thin films10.1016/j.jcrysgro.2014.02.032 ↗
61. Incorporation of indium into ε-gallium oxide epitaxial thin films grown via mist chemical vapour deposition for bandgap engineering10.1039/c7ce02103h ↗
62. Growth pressure controlled nucleation epitaxy of pure phase ε- and β-Ga2O3 films on Al2O3 via metal–organic chemical vapor deposition10.1021/acs.cgd.7b01576 ↗
63. Growth of α- and β-Ga2O3 epitaxial layers on sapphire substrates using liquid-injection MOCVD10.1088/1361-6641/ababdc ↗
64. Growth mechanism of α-Ga2O3 on a sapphire substrate by mist chemical vapor deposition using acetylacetonated gallium source solutions10.1063/5.0014056 ↗
65. Optical properties of mist CVD Grown α-Ga2O310.1109/lpt.2020.2976450 ↗
66. Surface termination structure of α-Ga2O3 film grown by mist chemical vapor deposition10.1063/1.4954673 ↗
67. Heteroepitaxial growth of α-Ga2O3 thin films on a-, c- and r-plane sapphire substrates by low-cost mist-CVD method10.1016/j.jallcom.2020.154776 ↗
68. Influence of carrier gases on the quality of epitaxial corundum-structured α-Ga2O3 films grown by mist chemical vapor deposition method10.3390/ma12223670 ↗
69. Growth of 2-inch α-Ga2O3 epilayers via rear-flow-controlled mist chemical vapor deposition10.1149/2.0301907jss ↗
70. Understanding thickness uniformity of Ga2O3 thin films grown by mist chemical vapor deposition10.1149/2.0381907jss ↗
71. Enhancement of epitaxial lateral overgrowth in the mist chemical vapor deposition of α-Ga2O3 by using a-plane sapphire substrate10.7567/1347-4065/ab55c6 ↗
72. Metalorganic chemical vapor deposition of α-Ga2O3 and α-(AlxGa1−x)2O3 thin films on m-plane sapphire substrates10.1063/5.0065087 ↗
73. Ultrahigh-speed growth of GaN by hydride vapor phase epitaxy10.1002/pssc.201000953 ↗
74. Preparation of a freestanding AlN substrate from a thick AlN layer grown by hydride vapor phase epitaxy on a bulk AlN substrate prepared by physical vapor transport10.1143/apex.5.055504 ↗
75. Comparison of O2 and H2O as oxygen source for homoepitaxial growth of β-Ga2O3 layers by halide vapor phase epitaxy10.1016/j.jcrysgro.2018.04.009 ↗
76. Halide vapor phase epitaxial growth of β-Ga2O3 and α-Ga2O3 films10.1063/1.5055680 ↗
77. Halide vapor phase epitaxy of twin-free α-Ga2O3 on sapphire (0001) substrates10.7567/apex.8.055501 ↗
78. Rapid growth of α-Ga2O3 by HCl-boosted halide vapor phase epitaxy and effect of precursor supply conditions on crystal properties10.1088/1361-6641/ab7843 ↗
79. Phase-controlled epitaxial lateral overgrowth of α-Ga2O3 by halide vapor phase epitaxy10.35848/1347-4065/ab6faf ↗
80. Elimination of threading dislocations in α-Ga2O3 by double-layered epitaxial lateral overgrowth10.35848/1882-0786/ab9fc5 ↗
81. Epitaxial stabilization of pseudomorphic α-Ga2O3 on sapphire (0001)10.7567/apex.8.011101 ↗
82. Phase formation and strain relaxation of Ga2O3 on c-plane and a-plane sapphire substrates as studied by synchrotron-based x-ray diffraction10.1063/1.4998804 ↗
83. Anisotropic optical properties of metastable (011̄2) α-Ga2O3 grown by plasma-assisted molecular beam epitaxy10.1103/physrevapplied.10.024047 ↗
84. Crystal orientation dictated epitaxy of ultrawide-bandgap 5.4- to 8.6-eV a-(AlGa)2O3 on m-plane sapphire10.1126/sciadv.abd5891 ↗
85. Tin-assisted growth of ε-Ga2O3 film and the fabrication of photodetectors on sapphire substrate by PLD10.1364/ome.8.003506 ↗
86. Tin-assisted synthesis of ε-Ga2O3 by molecular beam epitaxy10.1103/physrevapplied.8.054002 ↗
87. Structures and energetics of Ga2O3 polymorphs10.1088/0953-8984/19/34/346211 ↗
88. Heteroepitaxial growth of single-phase ε-Ga2O3 thin films on c-plane sapphire by mist chemical vapor deposition using a NiO buffer layer10.1039/c8ce01128a ↗
89. Control of crystal structure of Ga2O3 on sapphire substrate by introduction of α-(AlxGa1−x)2O3 buffer layer10.1002/pssb.201700326 ↗
90. Use of mist chemical vapor deposition to impart ferroelectric properties to ε-Ga2O3 thin films on SnO2/c-sapphire substrates10.1016/j.matlet.2018.08.082 ↗
91. Stoichiometric control for heteroepitaxial growth of smooth ε-Ga2O3 thin films on c-plane AlN templates by mist chemical vapor deposition10.7567/jjap.56.078004 ↗
92. Single-domain and atomically flat surface of κ-Ga2O3 thin films on FZ-grown ε-GaFeO3 substrates via step-flow growth mode10.1021/acsomega.0c04634 ↗
93. Quasi-heteroepitaxial growth of β-Ga2O3 on off-angled sapphire (0 0 0 1) substrates by halide vapor phase epitaxy10.1016/j.jcrysgro.2014.10.038 ↗
94. Growth and characterization of α-, β-, and ε-phases of Ga2O3 using MOCVD and HVPE techniques10.1080/21663831.2018.1443978 ↗
95. HVPE growth and characterization of ε-Ga2O3 films on various substrates10.1149/2162-8777/ab8b4c ↗
96. In-plane orientation control of (001) κ-Ga2O3 by epitaxial lateral overgrowth through a geometrical natural selection mechanism10.35848/1347-4065/abbc57 ↗
97. HCl flow-induced phase change of α-, β-, and ε-Ga2O3 films grown by MOCVD10.1021/acs.cgd.7b01791 ↗
98. Characterization of pseudomorphic γ-Ga2O3 and γ-Al2O3 films on MgAl2O4 substrates and the band-alignment at the coherent γ-Ga2O3/Al2O3 heterojunction interface10.7567/1347-4065/ab219f ↗
99. Fabrication of coherent γ-Al2O3/Ga2O3 superlattices on MgAl2O4 substrates10.7567/1882-0786/ab2196 ↗
100. Stabilizing the metastable γ phase in Ga2O3 thin films by Cu doping10.1016/j.jallcom.2017.10.162 ↗