New approaches for achieving more perfect transition metal oxide thin films
Source abstract
Abstract
This perspective considers the enormous promise of epitaxial functional transition metal oxide thin films for future applications in low power electronic and energy applications since they offer wide-ranging and highly tunable functionalities and multifunctionalities, unrivaled among other classes of materials. It also considers the great challenges that must be overcome for transition metal oxide thin films to meet what is needed in the application domain. These challenges arise from the presence of intrinsic defects and strain effects, which lead to extrinsic defects. Current conventional thin film deposition routes often cannot deliver the required perfection and performance. Since there is a strong link between the physical properties, defects and strain, routes to achieving more perfect materials need to be studied. Several emerging methods and modifications of current methods are presented and discussed. The reasons these methods better address the perfection challenge are considered and evaluated.
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Research context
OpenAlex topics: Electronic and Structural Properties of Oxides · Semiconductor materials and devices · ZnO doping and properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Science and Metallurgy, University of Cambridge 1 , 27 Charles Babbage Rd., Cambridge CB3 OFS, United Kingdom
Department of Materials Science and Engineering, University of Wisconsin-Madison 2 , 1550 Engineering Drive, Madison, Wisconsin 53706, USA
Department of Materials Science and Engineering, Cornell University 3 , 230 Bard Hall, Ithaca, New York 14853-1501, USA
Kavli Institute at Cornell for Nanoscale Science 4 , Ithaca, New York 14853, USA
Funding
National Science Foundation · U.S. Department of Energy · Royal Academy of Engineering · Isaac Newton Trust · Engineering and Physical Sciences Research Council FundRef identification ID: · H2020 European Research Council · American Friends of the Alexander von Humboldt Foundation
References (100+)
Show source-provided references
1. J. Solid State Chem. · 1984 · 53 · 19310.1016/0022-4596(84)90094-x ↗
2. Acc. Chem. Res. · 1989 · 22 · 10610.1021/ar00159a004 ↗
3. Annu. Rev. Phys. Chem. · 1989 · 40 · 29110.1146/annurev.pc.40.100189.001451 ↗
4. Phys. Rev. B · 1996 · 53 · 334810.1103/physrevb.53.3348 ↗
5. Solid State Commun. · 2002 · 122 · 4910.1016/s0038-1098(02)00087-x ↗
6. MRS Bull. · 2018 · 43 · 22010.1557/mrs.2018.35 ↗
7. Mater. Today · 2007 · 10 · 4010.1016/s1369-7021(07)70078-0 ↗
8. J. Electroceram. · 2006 · 17 · 14110.1007/s10832-006-9734-2 ↗
9. Appl. Phys. Lett. · 2010 · 97 · 01210710.1063/1.3457994 ↗
10. Phys. Rev. B · 2013 · 87 · 19540910.1103/physrevb.87.195409 ↗
11. Nature · 502 · 53210.1038/nature12582 ↗
12. J. Phys. D: Appl. Phys. · 2014 · 47 · 03400610.1088/0022-3727/47/3/034006 ↗
13. J. Am. Ceram. Soc. · 2008 · 91 · 242910.1111/j.1551-2916.2008.02556.x ↗
14. Nature · 2004 · 427 · 42310.1038/nature02308 ↗
15. Deloitte · 2019 · 5
16. Nat. Mater. · 2012 · 11 · 9210.1038/nmat3225 ↗
17. J. Alloys Compd. · 2020 · 821 · 15353210.1016/j.jallcom.2019.153532 ↗
18. Mater. Lett. · 2020 · 262 · 12707410.1016/j.matlet.2019.127074 ↗
19. J. Nanosci. Nanotechnol. · 2020 · 20 · 411010.1166/jnn.2020.17556 ↗
20. Phys. Rev. Lett. · 2002 · 88 · 23550110.1103/physrevlett.88.235501 ↗
21. Acta Mater. · 2007 · 55 · 653510.1016/j.actamat.2007.07.054 ↗
22. Nature · 1956 · 177 · 18210.1038/177182a0 ↗
23. Physica E · 2003 · 20 · 5710.1016/j.physe.2003.09.035 ↗
24. 1976
25. Adv. Mater. · 2009 · 21 · 382710.1002/adma.200900947 ↗
26. Trans. Indian Ceram. Soc. · 1988 · 47 · 17610.1080/0371750x.1988.10822921 ↗
27. Adv. Mater. · 2006 · 18 · 144510.1002/adma.200502622 ↗
28. Adv. Mater. · 2008 · 20 · 252810.1002/adma.200701919 ↗
29. Phys. Rev. B · 2013 · 87 · 16120110.1103/physrevb.87.161201 ↗
30. 2007
31. J. Appl. Phys. · 2008 · 103 · 10370310.1063/1.2921972 ↗
32. Appl. Phys. Lett. · 1989 · 55 · 59510.1063/1.102436 ↗
33. Mater. Sci. Eng.: B · 2001 · 87 · 28210.1016/s0921-5107(01)00726-7 ↗
34. Phys. Rev. Mater. · 2019 · 3 · 10520210.1103/physrevmaterials.3.105202 ↗
35. Thin Solid Films · 1998 · 325 · 10710.1016/s0040-6090(98)00507-0 ↗
36. Appl. Phys. Lett. · 2009 · 95 · 03290610.1063/1.3184767 ↗
37. Phys. Rev. B · 1996 · 54 · 899210.1103/physrevb.54.8992 ↗
38. Appl. Phys. Lett. · 2002 · 80 · 480110.1063/1.1484552 ↗
39. J. Appl. Phys. · 2005 · 97 · 10492110.1063/1.1915519 ↗
40. Appl. Surf. Sci. · 2018 · 455 · 22710.1016/j.apsusc.2018.05.173 ↗
41. J. Vac. Sci. Technol., A · 2019 · 37 · 02151010.1116/1.5082237 ↗
42. 2008
43. J. Phys. Chem. C · 2019 · 123 · 744710.1021/acs.jpcc.9b00078 ↗
44. J. Appl. Phys. · 2006 · 100 · 02410810.1063/1.2203208 ↗
45. Sci. Technol. Adv. Mater. · 2015 · 16 · 03600510.1088/1468-6996/16/3/036005 ↗
46. Science · 2009 · 324 · 36710.1126/science.1169678 ↗
47. Cryst. Growth Des. · 2018 · 18 · 438810.1021/acs.cgd.8b00366 ↗
48. J. Mater. Chem. C · 2019 · 7 · 912810.1039/c9tc02033k ↗
49. Philos. Mag. A · 1999 · 79 · 246110.1080/01418619908214294 ↗
50. Philos. Mag. · 2003 · 83 · 320110.1080/14786430310001603436 ↗
51. Phys. Rev. Lett. · 2012 · 109 · 15720710.1103/physrevlett.109.157207 ↗
52. Phys. Rev. Lett. · 2012 · 110 · 10720610.1103/physrevlett.110.107206 ↗
53. Appl. Phys. Lett. · 2003 · 83 · 459210.1063/1.1631055 ↗
54. Appl. Phys. Lett. · 2004 · 85 · 196710.1063/1.1789233 ↗
55. J. Appl. Phys. · 2013 · 113 · 17C71110.1063/1.4795422 ↗
56. Appl. Phys. Lett. · 2005 · 87 · 24191910.1063/1.2146069 ↗
57. Z. Naturforsch., A · 1958 · 13 · 108110.1515/zna-1958-1210 ↗
58. Thin Solid Films · 1982 · 88 · 29110.1016/0040-6090(82)90169-9 ↗
59. J. Appl. Phys. · 1968 · 39 · 403210.1063/1.1656901 ↗
60. Surf. Sci. · 1969 · 17 · 49410.1016/0039-6028(69)90125-3 ↗
61. J. Appl. Phys. · 1970 · 41 · 278010.1063/1.1659315 ↗
62. J. Appl. Phys. · 1971 · 42 · 207410.1063/1.1660490 ↗
63. J. Cryst. Growth · 1986 · 78 · 34210.1016/0022-0248(86)90070-9 ↗
64. Phys. Today · 1993 · 46 · 12510.1063/1.2809075 ↗
65. J. Cryst. Growth · 1992 · 123 · 53710.1016/0022-0248(92)90615-p ↗
66. J. Cryst. Growth · 1997 · 174 · 47310.1016/s0022-0248(96)01144-x ↗
67. Appl. Phys. Lett. · 1997 · 71 · 371210.1063/1.120490 ↗
68. Appl. Phys. Lett. · 1998 · 72 · 281710.1063/1.121468 ↗
69. J. Cryst. Growth · 1999 · 200 · 16110.1016/s0022-0248(98)01243-3 ↗
70. J. Vac. Sci. Technol., B · 2007 · 25 · 104910.1116/1.2715992 ↗
71. Appl. Phys. Lett. · 2007 · 91 · 07192210.1063/1.2767771 ↗
72. Phys. Rev. Mater. · 2017 · 1 · 02340310.1103/physrevmaterials.1.023403 ↗
73. Appl. Phys. Lett. · 2010 · 96 · 26290510.1063/1.3457786 ↗
74. APL Mater. · 2013 · 1 · 04211210.1063/1.4824041 ↗
75. Appl. Phys. Lett. · 2008 · 93 · 10210510.1063/1.2973180 ↗
76. Phys. Rev. B · 2009 · 79 · 20531810.1103/physrevb.79.205318 ↗
77. Appl. Phys. Lett. · 2012 · 101 · 13290710.1063/1.4755765 ↗
78. Phys. Rev. Lett. · 2013 · 110 · 08700410.1103/physrevlett.110.087004 ↗
79. APL Mater. · 2018 · 6 · 04610110.1063/1.5023477 ↗
80. Phys. Rev. Lett. · 2016 · 116 · 19700310.1103/physrevlett.116.197003 ↗
81. APL Mater. · 2018 · 6 · 10110810.1063/1.5053084 ↗
82. Phys. Rev. B · 2014 · 90 · 07514210.1103/physrevb.90.075142 ↗
83. Phys. Rev. Lett. · 2015 · 114 · 01640110.1103/physrevlett.114.016401 ↗
84. APL Mater. · 2017 · 5 · 11610710.1063/1.5001839 ↗
85. Realization of epitaxial thin films of the topological crystalline insulator Sr3SnO
86. J. Vac. Sci. Technol., A · 2009 · 27 · 46110.1116/1.3106610 ↗
87. J. Vac. Sci. Technol., A · 2013 · 31 · 04150310.1116/1.4804180 ↗
88. Appl. Phys. Express · 2014 · 7 · 12550210.7567/apex.7.125502 ↗
89. Adv. Funct. Mater. · 2016 · 26 · 727110.1002/adfm.201602767 ↗
90. Appl. Phys. Lett. · 2015 · 106 · 23310210.1063/1.4922213 ↗
91. Appl. Phys. Lett. · 2016 · 109 · 10190310.1063/1.4962388 ↗
92. J. Mater. Chem. C · 2017 · 5 · 573010.1039/c7tc00190h ↗
93. Phys. Rev. Mater. · 2017 · 1 · 06160110.1103/physrevmaterials.1.061601 ↗
94. Thin Solid Films · 1991 · 206 · 14310.1016/0040-6090(91)90409-q ↗
95. Appl. Phys. Lett. · 1991 · 59 · 304510.1063/1.105788 ↗
96. J. Appl. Phys. · 2010 · 107 · 12130110.1063/1.3386412 ↗
97. Nanotechnology · 2018 · 29 · 19570610.1088/1361-6528/aab16e ↗
98. Appl. Phys. Lett. · 2011 · 98 · 08211610.1063/1.3557050 ↗
99. Sci. Rep. · 2016 · 6 · 2659810.1038/srep26598 ↗
100. Science · 2007 · 315 · 138810.1126/science.1137430 ↗