journal article·2020-04Open access

Ga2O3‐Based Optical Applications: Gallium Oxide for High‐Power Optical Applications (Advanced Optical Materials 7/2020)

Huiyang Deng, Kenneth J. Leedle, Yu Miao, Dylan S. Black, Karel E. Urbanek, Joshua McNeur, Martin Kozák, Andrew Ceballos, Peter Hommelhoff, Olav Solgaard, Robert L. Byer, James S. Harris

Advanced Optical Materials· Volume 8· Issue 7

Abstract

In article number 1901522, Huiyang Deng and co-workers have leveraged the high laser damage threshold and moderate conductivity of Ga2O3 to demonstrate the first Ga2O3-based laser accelerator and show Ga2O3 as a promising material for high-power optical applications. With the distinct properties of Ga2O3 combined with advances in fabrication and wafer growth techniques, more Ga2O3-based high-power optical applications will be realized in the near future.
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Research context

OpenAlex topics: Ga2O3 and related materials

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Affiliations

Department of Electrical Engineering Stanford University Stanford CA 94305 USA

Department of Applied Physics Stanford University Stanford CA 94305 USA

Department of Physics Friedrich‐Alexander‐Universität Erlangen‐Nürnberg (FAU) Staudtstrasse 1 Erlangen 91058 Germany

Department of Materials Science and Engineering Stanford University Stanford CA 94305 USA

References

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