Ultrathin Dielectric Perfect Absorber: Large‐Area Low‐Cost Dielectric Perfect Absorber by One‐Step Sputtering (Advanced Optical Materials 9/2019)
Source abstract
Abstract
Shaowei Wang, Wei Lu and co-workers (article number 1801596) have developed an ultrathin perfect absorber with a dielectric plasmonic nanocomposite (TiN@AlN) and antireflective coating. The absorptivity is ultra-high with average photon escaping rate of only 0.4% in the whole visible range, which is especially suitable for harvesting solar energy and eliminating stray light. It can be fabricated by a low-cost one-step sputtering approach in a very large area (200 mm × 200 mm for demonstration) on almost any substrates, even for flexible ones.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Dielectric materials and actuators · Advanced Antenna and Metasurface Technologies · Metamaterials and Metasurfaces Applications
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Affiliations
State Key Laboratory of Infrared Physics Shanghai Institute of Technical Physics Chinese Academy of Sciences Shanghai 200083 China
Shanghai Engineering Research Center of Energy‐Saving Coatings Shanghai 200083 China
School of Optical and Electronic Information Huazhong Univeristy of Science and Technology Wuhan 430074 China
References
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