Polarization‐Selective Patterning in an Anisotropic Smectic B Film
Source abstract
Abstract
The versatility of optical lithography can be expanded by using the polarization state of light as an additional parameter next to the intensity of light. This result is confirmed by exposing a highly polarization-selective photoreactive material with polarization holography which results in the formation of defined grating structures.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Liquid Crystal Research Advancements · Photochromic and Fluorescence Chemistry · Orbital Angular Momentum in Optics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Functional Organic Materials & Devices Department of Chemical Engineering and Chemistry Eindhoven University of Technology 5600 MB Eindhoven The Netherlands
School of Engineering and Materials Science Queen Mary University of London London E1 4NS UK
References (32)
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