journal article·2026-01

Double‐Sided Epitaxial Structure with Quantum Dots‐Embedded Porous GaN for Enhanced Color Conversion

Jaeyoung Baik, Je‐Sung Lee, Jeongwoon Kim, Hoe‐Min Kwak, Jin‐Soo Kim, Yu‐Jin Park, Woo‐Lim Jeong, Hyeondong Lee, Joon Seop Kwak, Chang‐Mo Kang, Dong‐Seon Lee

Advanced Optical Materials· Volume 14· Issue 3
Publisher page

Abstract

Abstract Quantum dot enhancement films (QDEFs) have been widely used in mini‐light‐emitting‐diode (mini‐LED) backlight displays to meet the Rec. 2020 standard; however, these films consume excessive quantum dot (QD) materials and yield low light conversion efficiencies. Porous GaN has recently emerged as a promising alternative to the QDEFs approaches, owing to its ability to considerably enhance light conversion efficiency and reduce the consumption of QD materials. A novel double‐sided epitaxial structure is proposed in which a blue LED epitaxial layer is grown on one side of a sapphire substrate, and a QD‐embedded porous GaN layer is deposited on the opposite side. The proposed structure separates the porous layer from the LED epitaxial layer, unlike conventional monolithic porous GaN LED structures, thus enabling simultaneous optimization of light absorption and LED performance. The proposed structure with green and red QDs achieves light conversion efficiencies of 59% and 90%, respectively. The color gamut covers ≈122% of the National Television System Committee (1953) standard and 91% of the Rec. 2020 standard. These results suggest the potential of integrating QD‐based color conversion layers into mini‐LED backlight displays to develop next‐generation display technologies.
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · Silicon Nanostructures and Photoluminescence

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical Engineering and Computer Science Gwangju Institute of Science and Technology (GIST) Gwangju 61005 Republic of Korea

Thin GaN Material & Device Creative Research Section Electronics and Telecommunications Research Institute (ETRI) Daejeon 34129 Republic of Korea

Department of Energy Engineering Korea Institute of Energy Technology (KENTECH) Naju 58330 Republic of Korea

Department of Nanomechatronics Engineering Pusan National University Busan 46241 Republic of Korea

Department of Semiconductor Engineering Gwangju Institute of Science and Technology (GIST) Gwangju 61005 Republic of Korea

Funding

National Research Foundation of Korea

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