Geometrical Engineering of Giant Optical Dichroism in Rippled MoS2 Nanosheets
Source abstract
Abstract
Abstract A cost effective method to tailor the optical response of large‐area nanosheets of 2D materials is described. A reduced effective metalayer model is introduced to capture the key‐role of the out‐of‐plane component of the dielectric tensor. Such a model indicates that the optical extinction of 2D materials can be strongly altered by controlling the geometry at the local (i.e., subwavelength) scale. In particular, a giant linear optical dichroism at normal incidence is demonstrated, with major features around the excitonic peaks, that can be tailored by acting on the average curvature and slope of the nanosheets. The approach is experimentally demonstrated in few‐layer MoS2 grown by chemical vapor deposition on cm‐scale anisotropic nanopatterned substrates prepared by a self‐assembling technique, based on defocused ion beam sputtering. Major variations in the photoluminescence spectrum as a function of the average curvature and slope are also revealed. A full‐vectorial numerical study beyond the effective metalayer model and comprising strain effects induced by the geometry turns out to be consistent with such a complex scenario. The results demonstrate that the extrinsic geometrical engineering definitely opens viable way to tailor the optical properties and modulate bandgap of low dimensional materials.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · Advanced biosensing and bioanalysis techniques · Plasmonic and Surface Plasmon Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Dipartimento di Fisica Universitá di Genova Via Dodecaneso 33 Genova I‐16146 Italy
Dipartimento di Fisica Politecnico di Milano Piazza Leonardo da Vinci 32 Milano 20133 Italy
IMM‐CNR Unit of Agrate Brianza Via C. Olivetti 2 Agrate Brianza I‐20864 Italy
Dipartimento di Energia Politecnico di Milano Via G. Ponzio 34/3 Milano I‐20133 Italy
Istituto di Fotonica e Nanotecnologie del Consiglio Nazionale delle Ricerche Piazza Leonardo da Vinci 32 Milano 20133 Italy
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