Stimulus‐Responsive Thin‐Film Photonic Crystals from Rapid Self‐Assembly of Block Copolymers for Photopatterning

Rapid self-assembly (≈15 min) of parallel-aligned lamella-forming block-copolymer photonic-crystal thin films is carried out through the manipulation of solvent evaporation. A well-defined photopatterned thin-film photonic crystal can exhibit either a lower redshift reflectivity or unresponsiveness toward the external stimulus by control of its exposure time to UV irradiation. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.