Repetitive Hole‐Mask Colloidal Lithography for the Fabrication of Large‐Area Low‐Cost Plasmonic Multishape Single‐Layer Metasurfaces

A novel fabrication method, multiple repetitions of hole‐mask colloidal nanolithography, is introduced to create single‐layer metasurfaces with complex, multishape plasmonic nanostructures that exhibit desired optical functionalities. Large‐area and low‐cost fabrication of different samples with independently tunable resonances are demonstrated. These single‐layer metasurfaces may find applications as multiline surface‐enhanced infrared absorption and broadband substrates. This fabrication method is particularly suited for the creation of large‐area, single‐layer C₃‐rotationally symmetric, 3D chiral metasurfaces, and this approach circumvents common problems with elliptical birefringence and can be utilized for interaction with chiral substances.