journal article·2025-10

Enhancing Dark Current Suppression in Near‐Infrared Organic Photodetectors with Morphology Control and Self‐Assembled Monolayers

Wei Fu, Zelong Li, Yifan Ding, Maojie Zhang, Yong Cui, Hong Zhang, Xiaoliang Mo, Rongjun Zhang, Guangzheng Zuo

Advanced Optical Materials· Volume 13· Issue 28
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Abstract

Abstract This study addresses the challenges of high dark current density and low responsivity in near‐infrared organic photodetectors (NIR‐OPDs) through a synergistic strategy combining morphology control and interface engineering. A thick active layer incorporating solid additives effectively reduces the dark current density while preserving efficient charge transport. Subsequently, molecular interface modification using [2‐(9HCarbazol‐9‐yl)ethyl]phosphonic acid (2PACz) further suppresses the dark current and enhances photoresponsivity. Drift‐diffusion modeling, incorporating trap states, reveals that the 2PACz forms a dipole layer at the interface, lowering the injection barrier by ≈0.3 eV and eliminating traps within the device. Together, these strategies reduce the dark current density from the order of 10−5 A cm−2 (control) to the order of 10−8 A cm−2 at −1 V, and enhance the responsivity (R) from 0.50 A W−1(control) to 0.58 A W−1 at 864 nm. The resulting device exhibits a high shot‐noise‐limited specific detectivity (Dsℎ∗) reaching 9.57 × 1013 Jones, highlighting its exceptional sensitivity. This study demonstrates that combining morphology control with interface engineering effectively overcomes key performance limitations in NIR‐OPDs, providing valuable insights for the design of high‐performance organic photodetectors.
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Research context

OpenAlex topics: Organic Electronics and Photovoltaics · Perovskite Materials and Applications · Advanced Memory and Neural Computing

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute for Electric Light Sources College of Intelligent Robotics and Advanced Manufacturing Fudan University Shanghai 200433 P. R. China

Department of Optical Science and Engineering Key Laboratory of Micro and Nano Photonic Structures (MOE) Shanghai Engineering Research Center of Ultra‐Precision Optical Manufacturing Fudan University Shanghai 200433 P. R. China

National Engineering Research Center for Colloidal Materials School of Chemistry & Chemical Engineering Shandong University Jinan Shandong 250100 P. R. China

State Key Laboratory of Polymer Physics and Chemistry, Beijing National Laboratory for Molecular Sciences, CAS Research/Education Center for Excellence in Molecular Sciences Institute of Chemistry, Chinese Academy of Sciences Beijing 100190 P. R. China

State Key Laboratory of Photovoltaic Science and Technology Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception Department of Materials Science Institute of Optoelectronics Fudan University Shanghai 200433 P. R. China

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