Tailored Optical Functionality by Combining Electron‐Beam and Focused Gold‐Ion Beam Lithography for Solid and Inverse Coupled Plasmonic Nanostructures

Abstract Plasmonics is a field uniquely driven by advances in micro‐ and nanofabrication. Many design ideas pose significant challenges in their experimental realization and test the limits of modern fabrication techniques. Here, the combination of electron‐beam and gold ion‐beam lithography is introduced as an alternative and highly versatile route for the fabrication of complex and high fidelity plasmonic nanostructures. The capability of this strategy is demonstrated on a selection of planar as well as 3D nanostructures. Large area and extremely accurate structures are presented with little to no defects and errors. These structures exhibit exceptional quality in shape fidelity and alignment precision. The combination of the two techniques makes full use of their complementary capabilities for the realization of complex plasmonic structures with superior optical properties and functionalities as well as ultra‐distinct spectral features which will find wide application in plasmonics, nanooptics, metasurfaces, plasmonic sensing, and similar areas.