Diamond Nanophotonic Circuits Functionalized by Dip‐pen Nanolithography

Nanophotonic circuits based on polished diamond thin films are prepared. These circuits cover a wide wavelength range across the entire visible spectrum. Integrated devices are surface functionalized site-specifically and in parallel using dip-pen nanolithography with a minimum linewidth of 100 nm. Multicolor fluorescence is coupled into the underlying photo­nic network using microring resonators and grating structures. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.