Chemical Alkaline Etching of Silicon Mie Particles

Chemical etching via alkaline solutions is associated with electronic litho­graphy to structure at a nanometer scale silicon Mie resonators. Two different alkaline solutions are employed and their influences on the shape of the resonators are discussed. The method is applied on both amorphous and crystalline silicon coatings and silicon resonators are characterized by electron microscopy and optical spectroscopy, and then the different modes are identified thanks to numerical simulations. This method avoids the use of reactive ion etching and appears to be very well adapted to design silicon particles at a nanometer scale for applications in nanophotonics.