journal article·2019-05

Deep Ultraviolet Light Source from Ultrathin GaN/AlN MQW Structures with Output Power Over 2 Watt

Yixin Wang, Xin Rong, Sergey Ivanov, Valentin Jmerik, Zhaoying Chen, Hui Wang, Tao Wang, Ping Wang, Peng Jin, Yanan Chen, Vladimir Kozlovsky, Dmitry Sviridov, Michail Zverev, Elena Zhdanova, Nikita Gamov, Valentin Studenov, Hideto Miyake, Hongwei Li, Shiping Guo, Xuelin Yang, Fujun Xu, Tongjun Yu, Zhixin Qin, Weikun Ge, Bo Shen, Xinqiang Wang

Advanced Optical Materials· Volume 7· Issue 10
Publisher page

Abstract

Abstract High‐output‐power electron‐beam (e‐beam) pumped deep ultraviolet (DUV) light sources, operating at 230–270 nm, are achieved by adjusting the well thickness of binary ultrathin GaN/AlN multiple quantum wells. These structures are fabricated on high‐quality thermally annealed AlN templates by metal‐organic chemical vapor deposition. Owing to the reduced dislocation density, large electron–hole overlap, and efficient carrier injection by e‐beam, the DUV light sources demonstrate high output powers of 24.8, 122.5, and 178.8 mW at central wavelengths of 232, 244, and 267 nm, respectively. Further growth optimization and employing an e‐gun with increased beam current lead to a record output power of ≈2.2 W at emission wavelength of ≈260 nm, the key wavelength for water sterilization. This work manifests the practical levels of high‐output‐power DUV light sources operated by using e‐beam pumping method.
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · Photocathodes and Microchannel Plates

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of Artificial Microstructure and Mesoscopic Physics School of Physics Peking University Beijing 100871 P. R. China

Ioffe Institute Polytekhnicheskaya Str. 26 St. Petersburg 194021 Russia

Key Laboratory of Semiconductor Materials Science and Beijing Key Laboratory of Low‐dimensional Semiconductor Materials and Devices Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 P. R. China

P. N. Lebedev Physical Institute Leninsky Ave. 53 Moscow 119991 Russia

MIREA Moscow Technological University Vernadsky Ave. 78 Moscow 119454 Russia

Department of Electrical and Electronic Engineering Mie University Mie 514‐8507 Japan

Advanced Micro‐Fabrication Equipment Inc. Shanghai 201201 P. R. China

Collaborative Innovation Center of Quantum Matter Beijing 100871 P. R. China

Funding

NSAF Joint Fund · National Natural Science Foundation of China · Russian Foundation for Basic Research · Japan Society for the Promotion of Science · Japan Science and Technology Agency

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