Source abstract
Abstract
Abstract The two‐photon Schwarzschild effect in photoresists suitable for 3D laser lithography is revisited. The study ranges over seven orders of magnitude in exposure time (from 1 µs to 10 s) and investigates a wide variety of different photoresist compositions. For short exposure times (“regime I”), the laser power at the polymerization threshold can scale with the inverse square root of the exposure time, as naively to be expected for two‐photon absorption. Substantial deviations occur, however, for low photoinitiator concentrations. For intermediate exposure times (“regime II”), a Schwarzschild‐type of behavior is found, as discussed previously. For very long exposure times (“regime III”), an unexpected deviation from regime II is found. By presenting numerical solutions of the coupled 3D reaction–diffusion equations, this behavior is explained in terms of the diffusion of oxygen and photoinitiator molecules, respectively.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Nonlinear Optical Materials Studies · Ocular and Laser Science Research · Laser Material Processing Techniques
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Affiliations
Institute of Nanotechnology Karlsruhe Institute of Technology (KIT) 76128 Karlsruhe Germany
Institute of Applied Physics Karlsruhe Institute of Technology (KIT) 76128 Karlsruhe Germany
Institut FEMTO‐ST UMR 6174 CNRS Université de Bourgogne Franche‐Comté 25000 Besançon France
Macromolecular Architectures Institute of Technical Chemistry and Polymer Chemistry (ITCP) Karlsruhe Institute of Technology (KIT) Engesserstr. 18 76128 Karlsruhe Germany
School of Chemistry Physics and Mechanical Engineering Queensland University of Technology (QUT) 2 George Street Brisbane QLD 4000 Australia
Funding
Deutsche Forschungsgemeinschaft · Carl-Zeiss-Stiftung · Australian Research Council
References (30)
Show source-provided references
3. Baldacchini T. · 2016
20. Einstein A. · Ann. Phys. · 1905 · 322 · 12