Sensitive Photoresists for Rapid Multiphoton 3D Laser Micro‐ and Nanoprinting
Abstract
Research context
OpenAlex topics: Nonlinear Optical Materials Studies · Nanofabrication and Lithography Techniques · Laser Material Processing Techniques
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Affiliations
3DMM2O‐Cluster of Excellence (EXC‐2082/1‐390761711) Karlsruhe Institute of Technology (KIT) and Heidelberg University Karlsruhe 76131 Germany
Institute of Applied Physics (APH) Karlsruhe Institute of Technology (KIT) Karlsruhe 76128 Germany
Institute of Nanotechnology (INT) Karlsruhe Institute of Technology (KIT) Karlsruhe 76128 Germany
Macromolecular Architectures Institute of Chemical Technology and Polymer Chemistry (ITCP) Karlsruhe Institute of Technology (KIT) Karlsruhe 76128 Germany
School of Chemistry and Physics Queensland University of Technology (QUT) 2 George Street Brisbane QLD 4000 Australia
Centre for Materials Science Queensland University of Technology (QUT) 2 George Street Brisbane QLD 4000 Australia
Funding
Deutsche Forschungsgemeinschaft · Carl-Zeiss-Stiftung · Australian Research Council