journal article·2026-07-18

Zr 4+ ‐Tailored TiO 2 Memristors With Highly Linear Synaptic Plasticity for Neuromorphic Learning and Low‐Power Memory Technologies

Vaishali Chandmare, Kusum Kumari, R. J. Choudhary, Vinay Palaparthy, Narendar Vadthiya, Hitesh Borkar

Publisher page

Abstract

ABSTRACT This study reports the design and neuromorphic functionalization of solution‐processed Al/TO/FTO and Al/ZTO/FTO memristive devices, engineered through Zr 4 + aliovalent doping to modulate defect chemistry within TiO 2 . Structural, morphological, and spectroscopic analyses (XRD, FESEM, XPS) confirm successful incorporation of Zr 4 + ions, leading to refined nano crystallinity, enhanced oxygen‐vacancy density, and a stabilized anatase framework. The Zr‐doped device exhibits analogue bipolar resistive switching with reduced operating voltages and conduction governed by Ohmic transport, space charge‐limited conduction, Poole–Frenkel emission, and direct tunnelling. Superior electrical stability is demonstrated through endurance exceeding 10 4 cycles and retention beyond 10 3 s. Importantly, the Al/ZTO/FTO device delivers highly linear and symmetric long‐term potentiation and depression, along with a paired‐pulse facilitation index approaching 98%, effectively emulating biological synaptic plasticity. Its neuromorphic capability is further validated using a convolutional neural network trained on the MNIST dataset, achieving a recognition accuracy of 98.28% over 50 epochs. These findings position Zr 4 + ‐engineered TiO 2 as a promising platform for scalable analogue memory, artificial synapses, and low‐power neuromorphic computing.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Functional and Advanced Materials for Energy with Informatics Laboratory (FAME‐I lab) Department of Physics National Institute of Technology Warangal Telangana India

UGC‐DAE Consortium for Scientific Research Indore Madhya Pradesh India

System Design Lab Department of Information and Communication Technology DAIICT Gandhinagar Gujarat India

Department of Electronics and Communication Engineering National Institute of Technology Warangal Telangana India

References (47)

Show source-provided references
1. 10.1016/j.vlsi.2024.10220610.1016/j.vlsi.2024.102206 ↗
2. 10.1039/c6ra25618j10.1039/c6ra25618j ↗
3. 10.1016/j.tsf.2010.12.14910.1016/j.tsf.2010.12.149 ↗
4. 10.1016/j.mssp.2024.10868810.1016/j.mssp.2024.108688 ↗
5. 10.3390/nano1213228910.3390/nano12132289 ↗
6. 10.3390/nano1404038110.3390/nano14040381 ↗
7. 10.1002/aelm.20150013810.1002/aelm.201500138 ↗
8. 10.1021/acsami.7b1119110.1021/acsami.7b11191 ↗
9. 10.1021/nn202983n10.1021/nn202983n ↗
10. 10.1039/d3tc04510b10.1039/d3tc04510b ↗
11. 10.1016/j.surfin.2022.10195010.1016/j.surfin.2022.101950 ↗
12. 10.1002/cta.404410.1002/cta.4044 ↗
13. 10.1021/acs.jpclett.5c0018410.1021/acs.jpclett.5c00184 ↗
14. 10.1007/s00339‐025‐08368‐310.1007/s00339‐025‐08368‐3 ↗
15. 10.1039/d4tc02289k10.1039/d4tc02289k ↗
16. 10.1109/LED.2019.289988910.1109/LED.2019.2899889 ↗
17. 10.1016/j.mee.2021.11170610.1016/j.mee.2021.111706 ↗
18. 10.1016/j.apsusc.2015.03.08810.1016/j.apsusc.2015.03.088 ↗
19. 10.1021/ACSOMEGA.2C0510710.1021/ACSOMEGA.2C05107 ↗
20. 10.1016/j.apsusc.2016.016.09310.1016/j.apsusc.2016.016.093 ↗
21. 10.1016/j.ceramint.2015.04.06710.1016/j.ceramint.2015.04.067 ↗
22. 10.1016/j.jssc.2009.09.01610.1016/j.jssc.2009.09.016 ↗
23. 10.1016/j.apcata.2009.12.02510.1016/j.apcata.2009.12.025 ↗
24. 10.1063/5.026618910.1063/5.0266189 ↗
25. 10.1002/adma.20150275810.1002/adma.201502758 ↗
26. 10.1002/adfm.20252890010.1002/adfm.202528900 ↗
27. 10.1002/adma.20241118610.1002/adma.202411186 ↗
28. 10.1007/s10854‐021‐05710‐210.1007/s10854‐021‐05710‐2 ↗
29. 10.1002/adfm.20250750310.1002/adfm.202507503 ↗
30. 10.1002/smtd.20230165710.1002/smtd.202301657 ↗
31. 10.1016/j.jallcom.2025.17943910.1016/j.jallcom.2025.179439 ↗
32. 10.1016/j.rinp.2022.10595510.1016/j.rinp.2022.105955 ↗
33. 10.1002/admi.20240085510.1002/admi.202400855 ↗
34. 10.1016/j.jelechem.2024.11809210.1016/j.jelechem.2024.118092 ↗
35. 10.3390/surfaces703003810.3390/surfaces7030038 ↗
36. 10.1088/0953‐8984/28/26/26590110.1088/0953‐8984/28/26/265901 ↗
37. 10.1016/j.optmat.2024.11644610.1016/j.optmat.2024.116446 ↗
38. 10.1088/0022‐3727/46/4/04510310.1088/0022‐3727/46/4/045103 ↗
39. 10.1016/j.cap.2024.05.00510.1016/j.cap.2024.05.005 ↗
40. 10.1016/j.spmi.2021.10700810.1016/j.spmi.2021.107008 ↗
41. 10.1063/5.014915410.1063/5.0149154 ↗
42. 10.1016/j.matchemphys.2025.13076410.1016/j.matchemphys.2025.130764 ↗
43. 10.1016/j.jallcom.2024.17480210.1016/j.jallcom.2024.174802 ↗
44. 10.1016/j.surfin.2025.10635710.1016/j.surfin.2025.106357 ↗
45. 10.1016/j.mssp.2023.10799810.1016/j.mssp.2023.107998 ↗
46. 10.1002/aelm.20240000810.1002/aelm.202400008 ↗
47. 10.1021/ACSAMI.2C1722810.1021/ACSAMI.2C17228 ↗