Laser Lithography of Monolithically‐Integrated Multi‐Level Microchannels in Silicon (Adv. Mater. Technol. 9/2024)
Source abstract
Abstract
Monolithically Integrated Channels In article number 2301617, Onur Tokel and co-workers present a novel laser-lithography method, enabling the fabrication of micro-channels monolithically integrated into silicon. The method is used to create buried multi-level architectures, with robust control on geometry, depth, curvature, and aspect ratio. The wafer surface is preserved, establishing a path towards three-dimensional integration.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Laser Material Processing Techniques · Advancements in Photolithography Techniques · Optical Coatings and Gratings
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Affiliations
Department of Physics Bilkent University Ankara 06800 Turkey
UNAM – National Nanotechnology Research Center and Institute of Materials Science and Nanotechnology Bilkent University Ankara 06800 Turkey
References
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