Adaptable Microcontact Printing via Photochromic Optical‐Saturable Lithography
Source abstract
Abstract
Abstract A versatile and easily customizable mold platform for the microcontact printing of 1D and 2D patterns of dyes is developed. The mold is obtained by optical‐saturable lithography, which is optimized to give a fast process on millimeter size areas. Supported by a kinetic and an electro–magnetic model, 1D and 2D patterns are designed and successfully transferred on the photoresist layer and copied with polydimethylsiloxane (PDMS) to fabricate stamps that are to be used in the printing process. Fluorescence patterning, by means of these PDMS stamp, is validated and compared with the stamp structure.
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Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Electrowetting and Microfluidic Technologies · Force Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
INAF‐Osservatorio Astronomico di Brera via Bianchi 46 23807 Merate Italy
Politecnico di Milano Dipartimento di Chimica Materiali ed Ingegneria Chimica Piazza Leonardo da Vinci 32 20133 Milano Italy
Center for Nano Science and Technology @Polimi Istituto Italiano di Tecnologia via G. Pascoli 70/3 20133 Milan Italy
Funding
FP7 Research infrastructures
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