journal article·2025-10Open access

Machine Learning‐Based Optimization of Pixel Light Intensities for Improving Polymerization Accuracy in Digital Light Processing 3D Printing

Teerapong Poltue, Stuart Macrae Montgomery, Xiaohao Sun, Chao Zhang, Frédéric Demoly, Kun Zhou, H. Jerry Qi

Advanced Materials Technologies· Volume 10· Issue 20

Abstract

Abstract Digital light processing (DLP) 3D printing shows a significant increase in industrial applications due to its ability to fabricate complex parts with fine features. However, the printed sample suffers from oversizing and loss of small features because the solidification of photocuring‐resin beyond the targeted regions. To improve printing accuracy, there are significant efforts dedicated to modeling and optimizing the printing process. Nevertheless, most works do not accurately model the chemical reaction throughout the DLP, as doing so requires expensive computational cost. As a result, they are unable to capture the root cause of overcuring. In this work, a machine learning (ML) framework is presented to optimize light patterns to improve the printing accuracy. A reduced‐order model that can accurately track the evolution of the degree of conversion (DoC) of photocuring as a function of light dose in 3D space at low computational cost is introduced. Then, it is included in an ML to optimize light patterns for producing the DoCs that yield targeted shapes. The ML is applied to two resin formulations and complex geometries, demonstrating its robustness. The speed and accuracy of this approach pave the way for advanced applications of 3D printing, such as real‐time digital twinning.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Additive Manufacturing and 3D Printing Technologies · Photopolymerization techniques and applications · Industrial Vision Systems and Defect Detection

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

The George W. Woodruff School of Mechanical Engineering Georgia Institute of Technology Atlanta Georgia 30332 USA

School of Computational Science and Engineering Georgia Institute of Technology Atlanta Georgia 30332 USA

ICB UMR 6303 CNRS Belfort‐Montbeliard University of Technology UTBM Belfort 90010 France

Institut universitaire de France (IUF) Paris France

Singapore Centre for 3D Printing School of Mechanical and Aerospace Engineering Nanyang Technological University 50 Nanyang Avenue Singapore 639798 Singapore

Funding

Air Force Office of Scientific Research

References (51)

Show source-provided references
1. 10.1016/j.addma.2022.10280010.1016/j.addma.2022.102800 ↗
2. 10.1039/C7LC00644F10.1039/C7LC00644F ↗
3. 10.1016/j.addma.2022.10311810.1016/j.addma.2022.103118 ↗
4. 10.1016/j.eml.2021.10132310.1016/j.eml.2021.101323 ↗
5. 10.1038/s41467-023-36909-y10.1038/s41467-023-36909-y ↗
6. 10.1038/s41467-021-25788-w10.1038/s41467-021-25788-w ↗
7. 10.1016/j.eml.2020.10082410.1016/j.eml.2020.100824 ↗
8. 10.1016/j.ijmecsci.2021.10676210.1016/j.ijmecsci.2021.106762 ↗
9. 10.1093/jcde/qwac05210.1093/jcde/qwac052 ↗
10. 10.1126/sciadv.aav579010.1126/sciadv.aav5790 ↗
11. 10.1115/1.405696610.1115/1.4056966 ↗
12. 10.1016/j.addma.2023.10368710.1016/j.addma.2023.103687 ↗
13. 10.1126/sciadv.ade438110.1126/sciadv.ade4381 ↗
14. 10.1016/j.eml.2021.10140310.1016/j.eml.2021.101403 ↗
15. Zhou C. · 2009 · 543
16. 10.1002/aisy.20210007910.1002/aisy.202100079 ↗
17. 10.1016/j.addma.2023.10364110.1016/j.addma.2023.103641 ↗
18. 10.1016/j.jmapro.2019.02.01310.1016/j.jmapro.2019.02.013 ↗
19. 10.1016/j.addma.2020.10159510.1016/j.addma.2020.101595 ↗
20. 10.1002/admt.20230005210.1002/admt.202300052 ↗
21. 10.1115/1.404698610.1115/1.4046986 ↗
22. 10.1002/adma.20231000610.1002/adma.202310006 ↗
23. 10.1016/j.mtcomm.2024.11029410.1016/j.mtcomm.2024.110294 ↗
24. 10.1016/j.jmapro.2011.10.00210.1016/j.jmapro.2011.10.002 ↗
25. 10.1016/j.matdes.2024.11297810.1016/j.matdes.2024.112978 ↗
26. 10.1016/j.addma.2022.10295410.1016/j.addma.2022.102954 ↗
27. 10.1016/j.addma.2022.10280810.1016/j.addma.2022.102808 ↗
28. 10.1016/j.addma.2021.10192210.1016/j.addma.2021.101922 ↗
29. 10.1016/j.eml.2022.10171410.1016/j.eml.2022.101714 ↗
30. 10.1039/D0SM01968B10.1039/D0SM01968B ↗
31. 10.1002/adfm.20221325210.1002/adfm.202213252 ↗
32. 10.1016/j.addma.2025.10465910.1016/j.addma.2025.104659 ↗
33. 10.1002/advs.20230993210.1002/advs.202309932 ↗
34. 10.1016/j.jmps.2017.11.01810.1016/j.jmps.2017.11.018 ↗
35. 10.1002/aic.1066610.1002/aic.10666 ↗
36. 10.1016/S0079-6700(01)00004-110.1016/S0079-6700(01)00004-1 ↗
37. 10.1021/ma702117e10.1021/ma702117e ↗
38. 10.1002/adem.20180087610.1002/adem.201800876 ↗
39. 10.1002/cptc.20190016710.1002/cptc.201900167 ↗
40. 10.1126/science.117904710.1126/science.1179047 ↗
41. 10.1186/s40537-021-00444-810.1186/s40537-021-00444-8 ↗
42. J.Xu Z.Li B.Du M.Zhang J.Liu presented at2020 IEEE Symposium on Computers and communications (ISCC) IEEE Piscataway NJ2020 p.978.
43. Hussain M. · 2018 · 191
44. 10.1109/ACCESS.2018.281084910.1109/ACCESS.2018.2810849 ↗
45. P.Thanapol K.Lavangnananda P.Bouvry F.Pinel F.Leprévost presented at2020–5th International Conference on Information Technology IEEE Piscataway NJ2020.
46. 10.1016/j.ajodo.2013.04.01710.1016/j.ajodo.2013.04.017 ↗
47. 10.1016/j.ajodo.2019.10.01210.1016/j.ajodo.2019.10.012 ↗
48. 10.1038/s41467-022-30802-w10.1038/s41467-022-30802-w ↗
49. 10.1021/acs.macromol.1c0225210.1021/acs.macromol.1c02252 ↗
50. 10.1007/978‐3‐319‐58347‐1_110.1007/978‐3‐319‐58347‐1_1 ↗
51. 10.1038/nature1453910.1038/nature14539 ↗