journal article·2019-12Open access

Electrically Conductive, Reduced Graphene Oxide Structures Fabricated by Inkjet Printing and Low Temperature Plasma Reduction

Yongkun Sui, Allison Hess‐Dunning, Peiran Wei, Emily Pentzer, R. Mohan Sankaran, Christian A. Zorman

Advanced Materials Technologies· Volume 4· Issue 12

Abstract

Abstract Here, an environmentally‐friendly and scalable process is reported to synthesize reduced graphene oxide (RGO) thin films for printed electronics applications. The films are produced by inkjet printing GO flakes dispersed binder‐free in aqueous solutions followed by treatment with a nonthermal, radio‐frequency (RF) plasma containing only argon (Ar) gas. The plasma process is found to heat the substrate to temperatures no greater than 138 °C, enabling RGO to be printed directly on a wide range of temperature‐sensitive substrate materials including photo paper. Unlike other low‐temperature methods such as electrochemical reduction, plasma reduction is friendly to moisture absorbent materials. Moreover, the plasma treatment can be performed on nonconducting substrates, eliminating the need for film transfer. From an applications perspective, the printed, plasma‐reduced RGO exhibits excellent electrical, mechanical, and electrochemical properties. As a technology demonstrator, the working electrodes of hydrogen peroxide (H2O2) sensors fabricated from plasma‐reduced GO show a sensitivity of 277 ± 80 µA mm−1 cm−2, which is comparable to RGO working electrodes made by electrochemical reduction.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Graphene research and applications · Advanced Sensor and Energy Harvesting Materials · Electrochemical sensors and biosensors

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical, Computer and Systems Engineering Case Western Reserve University 10900 Euclid Avenue Cleveland OH 44106 USA

Rehabilitation Research and Development Louis Stokes Cleveland Department of Veterans Affairs Medical Center Cleveland OH 44106 USA

Advanced Platform Technology Center Louis Stokes Cleveland Department of Veterans Affairs Medical Center 10701 East Boulevard Cleveland OH 44106 USA

Department of Chemistry Case Western Reserve University Cleveland OH 44106 USA

Department of Chemical and Biomolecular Engineering Case Western Reserve University Cleveland OH 44106 USA

Funding

National Science Foundation

References (55)

Show source-provided references
1. 10.1088/2053-1583/aa7d7110.1088/2053-1583/aa7d71 ↗
2. 10.1016/j.elecom.2011.01.02310.1016/j.elecom.2011.01.023 ↗
3. 10.1002/elan.20090057110.1002/elan.200900571 ↗
4. 10.1021/acsaem.8b0024010.1021/acsaem.8b00240 ↗
5. 10.1021/nn204460910.1021/nn2044609 ↗
6. 10.1002/adma.20130036110.1002/adma.201300361 ↗
7. 10.1039/C4FD00067F10.1039/C4FD00067F ↗
8. 10.1021/ie502675z10.1021/ie502675z ↗
9. 10.1016/j.ssc.2015.08.01110.1016/j.ssc.2015.08.011 ↗
10. 10.1016/j.carbon.2016.04.01210.1016/j.carbon.2016.04.012 ↗
11. 10.1016/j.carbon.2016.02.01310.1016/j.carbon.2016.02.013 ↗
12. 10.1021/acsnano.7b0379510.1021/acsnano.7b03795 ↗
13. 10.1021/acsami.7b0009210.1021/acsami.7b00092 ↗
14. Sinar D. · 2014
15. 10.1016/j.matchemphys.2016.06.07610.1016/j.matchemphys.2016.06.076 ↗
16. 10.1039/C7RA10416B10.1039/C7RA10416B ↗
17. 10.1002/admt.20170001110.1002/admt.201700011 ↗
18. 10.1002/cssc.20170213910.1002/cssc.201702139 ↗
19. 10.1021/jz400644c10.1021/jz400644c ↗
20. 10.1039/C8CS00738A10.1039/C8CS00738A ↗
21. Maher M. A. · 2013
22. 10.1039/C6NR04310K10.1039/C6NR04310K ↗
23. 10.1021/ac900136z10.1021/ac900136z ↗
24. 10.1016/j.bios.2016.01.08010.1016/j.bios.2016.01.080 ↗
25. 10.1246/cl.15010110.1246/cl.150101 ↗
26. 10.1063/1.490659310.1063/1.4906593 ↗
27. 10.1021/acsami.7b0718910.1021/acsami.7b07189 ↗
28. 10.1039/C4TC01820F10.1039/C4TC01820F ↗
29. 10.1002/adma.20150286610.1002/adma.201502866 ↗
30. 10.14445/22315381/IJETT-V49P22010.14445/22315381/IJETT-V49P220 ↗
31. 10.1002/adma.20080019810.1002/adma.200800198 ↗
32. 10.1021/jz300080p10.1021/jz300080p ↗
33. 10.1088/1367-2630/13/2/02500810.1088/1367-2630/13/2/025008 ↗
34. 10.1016/j.carbon.2012.02.01610.1016/j.carbon.2012.02.016 ↗
35. 10.1016/j.carbon.2017.10.07510.1016/j.carbon.2017.10.075 ↗
36. 10.1063/1.491973210.1063/1.4919732 ↗
37. Wang J. · Asian J. Chem. · 2012 · 24 · 3933
38. 10.1016/j.carbon.2013.02.01510.1016/j.carbon.2013.02.015 ↗
39. 10.1021/ja01539a01710.1021/ja01539a017 ↗
40. 10.1016/j.ejbas.2016.11.00210.1016/j.ejbas.2016.11.002 ↗
41. Lin Z. · 2014
42. C. I.Contescu T. D.Burchell Oak Ridge National Laboratory 2005.
43. 10.1063/1.492323810.1063/1.4923238 ↗
44. 10.1002/adfm.20090016610.1002/adfm.200900166 ↗
45. Seung H. H. · 2011 · 73
46. 10.1021/jp811377n10.1021/jp811377n ↗
47. 10.1016/j.carbon.2007.02.03410.1016/j.carbon.2007.02.034 ↗
48. 10.1016/j.carbon.2009.12.05710.1016/j.carbon.2009.12.057 ↗
49. 10.1021/nl201432g10.1021/nl201432g ↗
50. 10.1021/acs.jpcc.5b0314410.1021/acs.jpcc.5b03144 ↗
51. 10.1063/1.478954510.1063/1.4789545 ↗
52. 10.1016/j.scriptamat.2018.11.04810.1016/j.scriptamat.2018.11.048 ↗
53. 10.1016/S0013-4686(97)00125-410.1016/S0013-4686(97)00125-4 ↗
54. 10.1021/ac011052p10.1021/ac011052p ↗
55. 10.1016/j.elecom.2012.04.00210.1016/j.elecom.2012.04.002 ↗