Excimer Laser Etching
Source abstract
Abstract
Excimer laser radiation at a wavelength of = 248 nm represents a new etching method for the preparation of metallographic specimens. The method is shown to be particularly effective for enhancing the contrast between different phases in a multiphase metallographic specimen.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Laser Material Processing Techniques · Surface Roughness and Optical Measurements · Welding Techniques and Residual Stresses
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References
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