Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High‐ k Rutile Capacitors (Adv. Mater. Interfaces 14/2026)
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Semiconductor materials and devices · Transition Metal Oxide Nanomaterials · Electronic and Structural Properties of Oxides
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Chemistry University of Helsinki Helsinki Finland
Department of Physics University of Helsinki Helsinki Finland
ASM Microchemistry Oy Helsinki Finland
References
Reference metadata was not supplied for this record.