Enhancing Grayscale E‐Beam Lithography: Thermal Treatment of Novolak‐Based Resist for 3D Nanostructures (Adv. Mater. Interfaces 4/2026)
Source abstract
Abstract
Grayscale 3D-Nanostrucures In the Research Article (DOI: 10.1002/admi.202500632) Winnie Edith Svendsen and co-workers demonstrate the fabrication of high-resolution 3D nanostructures using grayscale electron beam lithography. By tuning exposure dose and post-exposure thermal treatment of novolak-based resist, they reveal dose and temperature dependent reflow and chemical evolution, enabling fabrication of complex topographies for applications in photonics, biomimetics, and surface engineering. Art by Rahul Singh.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Nanomaterials and Printing Technologies · Advancements in Photolithography Techniques
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Affiliations
DTU Bioengineering Danmarks Tekniske Universitet (DTU) Kongens Lyngby 2800 Denmark
References
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