Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition
Abstract
Research context
OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices · Electronic and Structural Properties of Oxides
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Affiliations
Department of Physics Education Seoul National University Seoul 08826 Republic of Korea
Department of Physics Ulsan National Institute of Science and Technology Ulsan 44919 Republic of Korea
Department of Energy Engineering School of Energy and Chemical Engineering Ulsan National Institute of Science and Technology Ulsan 44919 Republic of Korea
Graduate School of Semiconductor Materials and Devices Engineering Ulsan National Institute of Science and Technology (UNIST) Ulsan 44919 Republic of Korea
Center for Educational Research Seoul National University Seoul 08826 Republic of Korea
Funding
National Research Foundation of Korea · Ministry of Science and ICT, South Korea · National Supercomputing Center, Korea Institute of Science and Technology Information · Korea Institute for Advancement of Technology · Ministry of Trade, Industry and Energy